Polymer brush hypersurface photolithography

Polymer brush hypersurface photolithography

Various lithographic approaches are being explored to create polymer brush patterns with micrometer-scale feature dimensions. Here the authors demonstrate a printing approach which allows independent control of the monomer composition and feature height of each pixel in a pattern, while circumventin...

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Autores principales: Carlos Carbonell, Daniel Valles, Alexa M. Wong, Andrea S. Carlini, Mollie A. Touve, Joanna Korpanty, Nathan C. Gianneschi, Adam B. Braunschweig
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2020
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Q
Acceso en línea:https://doaj.org/article/0492405d05ea430182cc6dc88d99954f
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spelling oai:doaj.org-article:0492405d05ea430182cc6dc88d99954f2021-12-02T17:32:11ZPolymer brush hypersurface photolithography10.1038/s41467-020-14990-x2041-1723https://doaj.org/article/0492405d05ea430182cc6dc88d99954f2020-03-01T00:00:00Zhttps://doi.org/10.1038/s41467-020-14990-xhttps://doaj.org/toc/2041-1723Various lithographic approaches are being explored to create polymer brush patterns with micrometer-scale feature dimensions. Here the authors demonstrate a printing approach which allows independent control of the monomer composition and feature height of each pixel in a pattern, while circumventing the need for expensive photomasks.Carlos CarbonellDaniel VallesAlexa M. WongAndrea S. CarliniMollie A. TouveJoanna KorpantyNathan C. GianneschiAdam B. BraunschweigNature PortfolioarticleScienceQENNature Communications, Vol 11, Iss 1, Pp 1-8 (2020)
institution DOAJ
collection DOAJ
language EN
topic Science
Q
spellingShingle Science
Q
Carlos Carbonell
Daniel Valles
Alexa M. Wong
Andrea S. Carlini
Mollie A. Touve
Joanna Korpanty
Nathan C. Gianneschi
Adam B. Braunschweig
Polymer brush hypersurface photolithography
description Various lithographic approaches are being explored to create polymer brush patterns with micrometer-scale feature dimensions. Here the authors demonstrate a printing approach which allows independent control of the monomer composition and feature height of each pixel in a pattern, while circumventing the need for expensive photomasks.
format article
author Carlos Carbonell
Daniel Valles
Alexa M. Wong
Andrea S. Carlini
Mollie A. Touve
Joanna Korpanty
Nathan C. Gianneschi
Adam B. Braunschweig
author_facet Carlos Carbonell
Daniel Valles
Alexa M. Wong
Andrea S. Carlini
Mollie A. Touve
Joanna Korpanty
Nathan C. Gianneschi
Adam B. Braunschweig
author_sort Carlos Carbonell
title Polymer brush hypersurface photolithography
title_short Polymer brush hypersurface photolithography
title_full Polymer brush hypersurface photolithography
title_fullStr Polymer brush hypersurface photolithography
title_full_unstemmed Polymer brush hypersurface photolithography
title_sort polymer brush hypersurface photolithography
publisher Nature Portfolio
publishDate 2020
url https://doaj.org/article/0492405d05ea430182cc6dc88d99954f
work_keys_str_mv AT carloscarbonell polymerbrushhypersurfacephotolithography
AT danielvalles polymerbrushhypersurfacephotolithography
AT alexamwong polymerbrushhypersurfacephotolithography
AT andreascarlini polymerbrushhypersurfacephotolithography
AT mollieatouve polymerbrushhypersurfacephotolithography
AT joannakorpanty polymerbrushhypersurfacephotolithography
AT nathancgianneschi polymerbrushhypersurfacephotolithography
AT adambbraunschweig polymerbrushhypersurfacephotolithography
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