Performance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated UV-Fenton process

Incomplete removal of antibiotics and antibiotic resistance genes (ARGs) has often been reported in wastewater treatment plants. More efficient treatment processes are needed to reduce their risks to the environment. Herein, we evaluated the degradation of antibiotics and ARGs by using magnetic anio...

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Autores principales:	Jie Zhong, Bin Yang, Fang-Zhou Gao, Qian Xiong, Yong Feng, Yu Li, Jin-Na Zhang, Guang-Guo Ying
Formato:	article
Lenguaje:	EN
Publicado:	Elsevier 2021
Materias:	Magnetic resin UV-Fenton Degradation Antibiotics Antibiotic resistance genes (ARGs) Wastewater Environmental pollution TD172-193.5 Environmental sciences GE1-350
Acceso en línea:	https://doaj.org/article/05b55f1805894ba69b36b617e29bcd2b
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spelling	oai:doaj.org-article:05b55f1805894ba69b36b617e29bcd2b2021-11-06T04:16:40ZPerformance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated UV-Fenton process0147-651310.1016/j.ecoenv.2021.112908https://doaj.org/article/05b55f1805894ba69b36b617e29bcd2b2021-12-01T00:00:00Zhttp://www.sciencedirect.com/science/article/pii/S0147651321010204https://doaj.org/toc/0147-6513Incomplete removal of antibiotics and antibiotic resistance genes (ARGs) has often been reported in wastewater treatment plants. More efficient treatment processes are needed to reduce their risks to the environment. Herein, we evaluated the degradation of antibiotics and ARGs by using magnetic anion exchange resin (MAER) as UV-Fenton catalyst. Sulfamethoxazole (SMZ), ofloxacin (OFX), and amoxicillin (AMX) were selected as the target compounds. The three antibiotics were almost completely degraded (> 99%) following the MAER UV-Fenton reaction for 30 min. From the degradation mechanism study, it was found that Fe3+/Fe2+ could be cyclically transferred from the catalyst at permeable interface, and the photo-generated electrons could be effectively separated. The dominant reactive radicals for antibiotics degradation were hydroxide during the MAER UV-Fenton reaction. The degradation pathway for sulfamethoxazole was proposed. In addition, wastewater samples from a wastewater treatment plant were applied to investigate the removal efficiency of antibiotics and their ARGs by the MAER UV-Fenton system. A rapid decrease in antibiotics and ARGs level was observed with this reaction system. The results from this study suggest that the MAER-mediated UV-Fenton reaction could be applied for the effective removal of antibiotics and ARGs in wastewater.Jie ZhongBin YangFang-Zhou GaoQian XiongYong FengYu LiJin-Na ZhangGuang-Guo YingElsevierarticleMagnetic resinUV-FentonDegradationAntibioticsAntibiotic resistance genes (ARGs)WastewaterEnvironmental pollutionTD172-193.5Environmental sciencesGE1-350ENEcotoxicology and Environmental Safety, Vol 227, Iss , Pp 112908- (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Magnetic resin UV-Fenton Degradation Antibiotics Antibiotic resistance genes (ARGs) Wastewater Environmental pollution TD172-193.5 Environmental sciences GE1-350
spellingShingle	Magnetic resin UV-Fenton Degradation Antibiotics Antibiotic resistance genes (ARGs) Wastewater Environmental pollution TD172-193.5 Environmental sciences GE1-350 Jie Zhong Bin Yang Fang-Zhou Gao Qian Xiong Yong Feng Yu Li Jin-Na Zhang Guang-Guo Ying Performance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated UV-Fenton process
description	Incomplete removal of antibiotics and antibiotic resistance genes (ARGs) has often been reported in wastewater treatment plants. More efficient treatment processes are needed to reduce their risks to the environment. Herein, we evaluated the degradation of antibiotics and ARGs by using magnetic anion exchange resin (MAER) as UV-Fenton catalyst. Sulfamethoxazole (SMZ), ofloxacin (OFX), and amoxicillin (AMX) were selected as the target compounds. The three antibiotics were almost completely degraded (> 99%) following the MAER UV-Fenton reaction for 30 min. From the degradation mechanism study, it was found that Fe3+/Fe2+ could be cyclically transferred from the catalyst at permeable interface, and the photo-generated electrons could be effectively separated. The dominant reactive radicals for antibiotics degradation were hydroxide during the MAER UV-Fenton reaction. The degradation pathway for sulfamethoxazole was proposed. In addition, wastewater samples from a wastewater treatment plant were applied to investigate the removal efficiency of antibiotics and their ARGs by the MAER UV-Fenton system. A rapid decrease in antibiotics and ARGs level was observed with this reaction system. The results from this study suggest that the MAER-mediated UV-Fenton reaction could be applied for the effective removal of antibiotics and ARGs in wastewater.
format	article
author	Jie Zhong Bin Yang Fang-Zhou Gao Qian Xiong Yong Feng Yu Li Jin-Na Zhang Guang-Guo Ying
author_facet	Jie Zhong Bin Yang Fang-Zhou Gao Qian Xiong Yong Feng Yu Li Jin-Na Zhang Guang-Guo Ying
author_sort	Jie Zhong
title	Performance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated UV-Fenton process
title_short	Performance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated UV-Fenton process
title_full	Performance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated UV-Fenton process
title_fullStr	Performance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated UV-Fenton process
title_full_unstemmed	Performance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated UV-Fenton process
title_sort	performance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated uv-fenton process
publisher	Elsevier
publishDate	2021
url	https://doaj.org/article/05b55f1805894ba69b36b617e29bcd2b
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Performance and mechanism in degradation of typical antibiotics and antibiotic resistance genes by magnetic resin-mediated UV-Fenton process

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