Analysis of the Conduction Mechanism and Copper Vacancy Density in p-type Cu2O Thin Films

Abstract A quantitative and analytical investigation on the conduction mechanism in p-type cuprous oxide (Cu2O) thin films is performed based on analysis of the relative dominance of trap-limited and grain-boundary-limited conduction. It is found that carrier transport in as-deposited Cu2O is govern...

Description complète

Enregistré dans:
Détails bibliographiques
Auteurs principaux: Sanggil Han, Andrew J. Flewitt
Format: article
Langue:EN
Publié: Nature Portfolio 2017
Sujets:
R
Q
Accès en ligne:https://doaj.org/article/064a34c83afb43f99bb7d088bb4b1b88
Tags: Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!