Adding chemically selective subtraction to multi-material 3D additive manufacturing

Subtractive manufacturing of microstructures is important for many applications, yet photoresists for 3D laser lithography allow only removal after development under harsh cleavage conditions. Here, the authors introduce a set of chemoselective cleavable photoresists allowing the orthogonal cleavage...

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Autores principales:	David Gräfe, Andreas Wickberg, Markus Michael Zieger, Martin Wegener, Eva Blasco, Christopher Barner-Kowollik
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2018
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/07257cbe1b704bfca1440ecc19a63087
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id	oai:doaj.org-article:07257cbe1b704bfca1440ecc19a63087
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spelling	oai:doaj.org-article:07257cbe1b704bfca1440ecc19a630872021-12-02T15:33:59ZAdding chemically selective subtraction to multi-material 3D additive manufacturing10.1038/s41467-018-05234-02041-1723https://doaj.org/article/07257cbe1b704bfca1440ecc19a630872018-07-01T00:00:00Zhttps://doi.org/10.1038/s41467-018-05234-0https://doaj.org/toc/2041-1723Subtractive manufacturing of microstructures is important for many applications, yet photoresists for 3D laser lithography allow only removal after development under harsh cleavage conditions. Here, the authors introduce a set of chemoselective cleavable photoresists allowing the orthogonal cleavage of microstructures under mild conditions.David GräfeAndreas WickbergMarkus Michael ZiegerMartin WegenerEva BlascoChristopher Barner-KowollikNature PortfolioarticleScienceQENNature Communications, Vol 9, Iss 1, Pp 1-6 (2018)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q David Gräfe Andreas Wickberg Markus Michael Zieger Martin Wegener Eva Blasco Christopher Barner-Kowollik Adding chemically selective subtraction to multi-material 3D additive manufacturing
description	Subtractive manufacturing of microstructures is important for many applications, yet photoresists for 3D laser lithography allow only removal after development under harsh cleavage conditions. Here, the authors introduce a set of chemoselective cleavable photoresists allowing the orthogonal cleavage of microstructures under mild conditions.
format	article
author	David Gräfe Andreas Wickberg Markus Michael Zieger Martin Wegener Eva Blasco Christopher Barner-Kowollik
author_facet	David Gräfe Andreas Wickberg Markus Michael Zieger Martin Wegener Eva Blasco Christopher Barner-Kowollik
author_sort	David Gräfe
title	Adding chemically selective subtraction to multi-material 3D additive manufacturing
title_short	Adding chemically selective subtraction to multi-material 3D additive manufacturing
title_full	Adding chemically selective subtraction to multi-material 3D additive manufacturing
title_fullStr	Adding chemically selective subtraction to multi-material 3D additive manufacturing
title_full_unstemmed	Adding chemically selective subtraction to multi-material 3D additive manufacturing
title_sort	adding chemically selective subtraction to multi-material 3d additive manufacturing
publisher	Nature Portfolio
publishDate	2018
url	https://doaj.org/article/07257cbe1b704bfca1440ecc19a63087
work_keys_str_mv	AT davidgrafe addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing AT andreaswickberg addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing AT markusmichaelzieger addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing AT martinwegener addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing AT evablasco addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing AT christopherbarnerkowollik addingchemicallyselectivesubtractiontomultimaterial3dadditivemanufacturing
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Adding chemically selective subtraction to multi-material 3D additive manufacturing

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