Adding chemically selective subtraction to multi-material 3D additive manufacturing

Subtractive manufacturing of microstructures is important for many applications, yet photoresists for 3D laser lithography allow only removal after development under harsh cleavage conditions. Here, the authors introduce a set of chemoselective cleavable photoresists allowing the orthogonal cleavage...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: David Gräfe, Andreas Wickberg, Markus Michael Zieger, Martin Wegener, Eva Blasco, Christopher Barner-Kowollik
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2018
Materias:
Q
Acceso en línea:https://doaj.org/article/07257cbe1b704bfca1440ecc19a63087
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!

Ejemplares similares