Adding chemically selective subtraction to multi-material 3D additive manufacturing
Subtractive manufacturing of microstructures is important for many applications, yet photoresists for 3D laser lithography allow only removal after development under harsh cleavage conditions. Here, the authors introduce a set of chemoselective cleavable photoresists allowing the orthogonal cleavage...
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Autores principales: | David Gräfe, Andreas Wickberg, Markus Michael Zieger, Martin Wegener, Eva Blasco, Christopher Barner-Kowollik |
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Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2018
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Materias: | |
Acceso en línea: | https://doaj.org/article/07257cbe1b704bfca1440ecc19a63087 |
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