Adding chemically selective subtraction to multi-material 3D additive manufacturing

Subtractive manufacturing of microstructures is important for many applications, yet photoresists for 3D laser lithography allow only removal after development under harsh cleavage conditions. Here, the authors introduce a set of chemoselective cleavable photoresists allowing the orthogonal cleavage...

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Bibliographic Details
Main Authors: David Gräfe, Andreas Wickberg, Markus Michael Zieger, Martin Wegener, Eva Blasco, Christopher Barner-Kowollik
Format: article
Language:EN
Published: Nature Portfolio 2018
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Online Access:https://doaj.org/article/07257cbe1b704bfca1440ecc19a63087
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