Surface Topography of Si/TiO<sub>2</sub> Stacked Layers on Silicon Substrate Deposited by KrF Excimer Laser Ablation

Surface Topography of Si/TiO<sub>2</sub> Stacked Layers on Silicon Substrate Deposited by KrF Excimer Laser Ablation

This study investigates the surface topography of the deposited thin films versus the distance between target and substrate (<i>d<sub>TS</sub></i>) inside a laser ablation equipment. The profile of the rough surface was obtained by atomic force microscopy data analysis based...

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Autores principales: Călin Constantin Moise, Aida Pantazi, Geanina Valentina Mihai, Alin Jderu, Mircea Bercu, Angelo Alberto Messina, Marius Enăchescu
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
Materias:
pulsed laser deposition
thin films
atomic force microscopy
power spectral density
surface topography
Engineering (General). Civil engineering (General)
TA1-2040
Acceso en línea:https://doaj.org/article/0e46cd79478a4414b9fa2f1cfcc779fb
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https://doaj.org/article/0e46cd79478a4414b9fa2f1cfcc779fb

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