Room-Temperature Formation of Hard BC<sub>x</sub> Films by Low Power Magnetron Sputtering
Boron carbide is one of the most important non-metallic materials. Amorphous BC<sub>x</sub> films were synthesized at room temperature by single- and dual-target magnetron sputtering processes. A B<sub>4</sub>C target and C target were operated using an RF signal and a DC sig...
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2021
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oai:doaj.org-article:1295ccf208ae4fe2b3732ca4342793882021-11-11T15:00:08ZRoom-Temperature Formation of Hard BC<sub>x</sub> Films by Low Power Magnetron Sputtering10.3390/app112198962076-3417https://doaj.org/article/1295ccf208ae4fe2b3732ca4342793882021-10-01T00:00:00Zhttps://www.mdpi.com/2076-3417/11/21/9896https://doaj.org/toc/2076-3417Boron carbide is one of the most important non-metallic materials. Amorphous BC<sub>x</sub> films were synthesized at room temperature by single- and dual-target magnetron sputtering processes. A B<sub>4</sub>C target and C target were operated using an RF signal and a DC signal, respectively. The effect of using single- and dual-target deposition and process parameters on the chemical bonding and composition of the films as well as their functional properties were characterized by Fourier transform infrared spectroscopy, Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray energy dispersive analysis, X-ray diffraction, ellipsometry, and spectrophotometry. It was found that the film properties depend on the sputtering power and the used targets. EDX data show that the composition of the samples varied from B<sub>2</sub>C to practically BC<sub>2</sub> in the case of using an additional C target. According to the XPS data, it corresponds to the different chemical states of the boron atom. A nanoindentation study showed that the film with a composition close to B<sub>2</sub>C deposited with the highest B<sub>4</sub>C target power reached a hardness of 25 GPa and Young’s modulus of 230 GPa. The optical properties of the films also depend on the composition, so the band gap (E<sub>g</sub>) of the BC<sub>x</sub> film varied in the range of 2.1–2.8 eV, while the E<sub>g</sub> of the carbon-rich films decreased to 1.1 eV.Veronica SulyaevaMaxim KhomyakovMarina KosinovaMDPI AGarticleboron carbidesthin filmsmagnetron sputteringmechanical propertiesoptical transmissionTechnologyTEngineering (General). Civil engineering (General)TA1-2040Biology (General)QH301-705.5PhysicsQC1-999ChemistryQD1-999ENApplied Sciences, Vol 11, Iss 9896, p 9896 (2021) |
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DOAJ |
| collection |
DOAJ |
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EN |
| topic |
boron carbides thin films magnetron sputtering mechanical properties optical transmission Technology T Engineering (General). Civil engineering (General) TA1-2040 Biology (General) QH301-705.5 Physics QC1-999 Chemistry QD1-999 |
| spellingShingle |
boron carbides thin films magnetron sputtering mechanical properties optical transmission Technology T Engineering (General). Civil engineering (General) TA1-2040 Biology (General) QH301-705.5 Physics QC1-999 Chemistry QD1-999 Veronica Sulyaeva Maxim Khomyakov Marina Kosinova Room-Temperature Formation of Hard BC<sub>x</sub> Films by Low Power Magnetron Sputtering |
| description |
Boron carbide is one of the most important non-metallic materials. Amorphous BC<sub>x</sub> films were synthesized at room temperature by single- and dual-target magnetron sputtering processes. A B<sub>4</sub>C target and C target were operated using an RF signal and a DC signal, respectively. The effect of using single- and dual-target deposition and process parameters on the chemical bonding and composition of the films as well as their functional properties were characterized by Fourier transform infrared spectroscopy, Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray energy dispersive analysis, X-ray diffraction, ellipsometry, and spectrophotometry. It was found that the film properties depend on the sputtering power and the used targets. EDX data show that the composition of the samples varied from B<sub>2</sub>C to practically BC<sub>2</sub> in the case of using an additional C target. According to the XPS data, it corresponds to the different chemical states of the boron atom. A nanoindentation study showed that the film with a composition close to B<sub>2</sub>C deposited with the highest B<sub>4</sub>C target power reached a hardness of 25 GPa and Young’s modulus of 230 GPa. The optical properties of the films also depend on the composition, so the band gap (E<sub>g</sub>) of the BC<sub>x</sub> film varied in the range of 2.1–2.8 eV, while the E<sub>g</sub> of the carbon-rich films decreased to 1.1 eV. |
| format |
article |
| author |
Veronica Sulyaeva Maxim Khomyakov Marina Kosinova |
| author_facet |
Veronica Sulyaeva Maxim Khomyakov Marina Kosinova |
| author_sort |
Veronica Sulyaeva |
| title |
Room-Temperature Formation of Hard BC<sub>x</sub> Films by Low Power Magnetron Sputtering |
| title_short |
Room-Temperature Formation of Hard BC<sub>x</sub> Films by Low Power Magnetron Sputtering |
| title_full |
Room-Temperature Formation of Hard BC<sub>x</sub> Films by Low Power Magnetron Sputtering |
| title_fullStr |
Room-Temperature Formation of Hard BC<sub>x</sub> Films by Low Power Magnetron Sputtering |
| title_full_unstemmed |
Room-Temperature Formation of Hard BC<sub>x</sub> Films by Low Power Magnetron Sputtering |
| title_sort |
room-temperature formation of hard bc<sub>x</sub> films by low power magnetron sputtering |
| publisher |
MDPI AG |
| publishDate |
2021 |
| url |
https://doaj.org/article/1295ccf208ae4fe2b3732ca434279388 |
| work_keys_str_mv |
AT veronicasulyaeva roomtemperatureformationofhardbcsubxsubfilmsbylowpowermagnetronsputtering AT maximkhomyakov roomtemperatureformationofhardbcsubxsubfilmsbylowpowermagnetronsputtering AT marinakosinova roomtemperatureformationofhardbcsubxsubfilmsbylowpowermagnetronsputtering |
| _version_ |
1718437863008239616 |