A Study on the Characteristic and Antibacterial Activity of Ti<sub>3</sub>O<sub>x</sub> Thin Films
A pure Ti target in Ar/O<sub>2</sub> gas mixture was used to synthesize Ti<sub>3</sub>O<sub>x</sub> thin film on a glass substrate by Reactive High-Power Impulse Magnetron Sputtering (HiPIMS) under different sputtering power (2 and 2.5 kW). The influence of HiPIMS...
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| Autores principales: | , , , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
MDPI AG
2021
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/12f42ff9a1b94298b54abc7c01b14e5b |
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| Sumario: | A pure Ti target in Ar/O<sub>2</sub> gas mixture was used to synthesize Ti<sub>3</sub>O<sub>x</sub> thin film on a glass substrate by Reactive High-Power Impulse Magnetron Sputtering (HiPIMS) under different sputtering power (2 and 2.5 kW). The influence of HiPIMS parameters on thin films’ structural, morphological, chemical composition, optical and photocatalytic, and antibacterial properties was investigated. In this study, Ti<sub>3</sub>O<sub>x</sub> thin films can be synthesized using the HiPIMS method without the post-annealing process. Two co-existence phases (hexagonal Ti<sub>3</sub>O and base-centered monoclinic Ti<sub>3</sub>O<sub>5</sub> phases) existed on the Ti<sub>3</sub>O<sub>x</sub> films. It is found that the peak intensity of (006) Ti<sub>3</sub>O hexagonal slightly increased as the sputtering power increased from 2 to 2.5 kW. The Ti<sub>3</sub>O<sub>x</sub> thin-film bandgap values were 3.36 and 3.50 eV for 2 and 2.5 kW, respectively. The Ti<sub>3</sub>O<sub>x</sub> films deposited at 2.5 kW showed good photocatalytic activity under UV light irradiation, with a higher methylene blue dye degradation rate than TiO<sub>2</sub> thin films. The antibacterial study on Ti<sub>3</sub>O<sub>x</sub> thin films exhibited a high inhibition percentage against <i>E. coli</i> and <i>S. aureus</i>. This study demonstrates that Ti<sub>3</sub>O<sub>x</sub> thin films can promote high photocatalytic and antibacterial activity. |
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