Experimental Determination of Interface Trap Density and Fixed Positive Oxide Charge in Commercial 4H-SiC Power MOSFETs

We measure interface trap density near the conduction band edge and fixed oxide charge in commercial, packaged, 4H-SiC 1.2 kV planar Power MOSFETs. These traps determine the device threshold voltage, performance, and reliability. The subthreshold slope is used to extract interface trap density at th...

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Autores principales: Susanna Yu, Marvin H. White, Anant K. Agarwal
Formato: article
Lenguaje:EN
Publicado: IEEE 2021
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Acceso en línea:https://doaj.org/article/139bcc50ed04403e87e1cbfc5d812f11
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