Effects of multi-layer Ti/Al electrode and ohmic groove etching on ohmic characteristics of AlGaN/GaN HEMT devices

This experiment studied the effects of multi-layer Ti/Al electrodes, ohmic groove etching, and annealing temperature on the ohmic characteristics, output characteristics, and surface topography of AlGaN/GaN high electron mobility transistor (HEMT) devices. In the experiment, we prepared the device s...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Yanxu Zhu, Jianwei Li, Qixuan Li, Xiaomeng Song, Zhangyang Tan, Jinheng Li
Formato: article
Lenguaje:EN
Publicado: AIP Publishing LLC 2021
Materias:
Acceso en línea:https://doaj.org/article/13b45d27f78e4327bc6e996db4762451
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!