$Near-field sub-diffraction photolithography with an elastomeric photomask$
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Near-field sub-diffraction photolithography with an elastomeric photomask

Photolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a co...

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Autores principales:	Sangyoon Paik, Gwangmook Kim, Sehwan Chang, Sooun Lee, Dana Jin, Kwang-Yong Jeong, I Sak Lee, Jekwan Lee, Hongjae Moon, Jaejun Lee, Kiseok Chang, Su Seok Choi, Jeongmin Moon, Soonshin Jung, Shinill Kang, Wooyoung Lee, Heon-Jin Choi, Hyunyong Choi, Hyun Jae Kim, Jae-Hyun Lee, Jinwoo Cheon, Miso Kim, Jaemin Myoung, Hong-Gyu Park, Wooyoung Shim
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2020
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/1987c102c64a454185373731c0b8d245
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

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spelling	oai:doaj.org-article:1987c102c64a454185373731c0b8d2452021-12-02T17:31:08ZNear-field sub-diffraction photolithography with an elastomeric photomask10.1038/s41467-020-14439-12041-1723https://doaj.org/article/1987c102c64a454185373731c0b8d2452020-02-01T00:00:00Zhttps://doi.org/10.1038/s41467-020-14439-1https://doaj.org/toc/2041-1723Photolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a cost effective near-field optical printing approach.Sangyoon PaikGwangmook KimSehwan ChangSooun LeeDana JinKwang-Yong JeongI Sak LeeJekwan LeeHongjae MoonJaejun LeeKiseok ChangSu Seok ChoiJeongmin MoonSoonshin JungShinill KangWooyoung LeeHeon-Jin ChoiHyunyong ChoiHyun Jae KimJae-Hyun LeeJinwoo CheonMiso KimJaemin MyoungHong-Gyu ParkWooyoung ShimNature PortfolioarticleScienceQENNature Communications, Vol 11, Iss 1, Pp 1-13 (2020)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Sangyoon Paik Gwangmook Kim Sehwan Chang Sooun Lee Dana Jin Kwang-Yong Jeong I Sak Lee Jekwan Lee Hongjae Moon Jaejun Lee Kiseok Chang Su Seok Choi Jeongmin Moon Soonshin Jung Shinill Kang Wooyoung Lee Heon-Jin Choi Hyunyong Choi Hyun Jae Kim Jae-Hyun Lee Jinwoo Cheon Miso Kim Jaemin Myoung Hong-Gyu Park Wooyoung Shim Near-field sub-diffraction photolithography with an elastomeric photomask
description	Photolithography is an established microfabrication technique but commonly uses costly shortwavelength light sources to achieve high resolution. Here the authors use metal patterns embedded in a flexible elastomer photomask with mechanical robustness for generation of subdiffraction patterns as a cost effective near-field optical printing approach.
format	article
author	Sangyoon Paik Gwangmook Kim Sehwan Chang Sooun Lee Dana Jin Kwang-Yong Jeong I Sak Lee Jekwan Lee Hongjae Moon Jaejun Lee Kiseok Chang Su Seok Choi Jeongmin Moon Soonshin Jung Shinill Kang Wooyoung Lee Heon-Jin Choi Hyunyong Choi Hyun Jae Kim Jae-Hyun Lee Jinwoo Cheon Miso Kim Jaemin Myoung Hong-Gyu Park Wooyoung Shim
author_facet	Sangyoon Paik Gwangmook Kim Sehwan Chang Sooun Lee Dana Jin Kwang-Yong Jeong I Sak Lee Jekwan Lee Hongjae Moon Jaejun Lee Kiseok Chang Su Seok Choi Jeongmin Moon Soonshin Jung Shinill Kang Wooyoung Lee Heon-Jin Choi Hyunyong Choi Hyun Jae Kim Jae-Hyun Lee Jinwoo Cheon Miso Kim Jaemin Myoung Hong-Gyu Park Wooyoung Shim
author_sort	Sangyoon Paik
title	Near-field sub-diffraction photolithography with an elastomeric photomask
title_short	Near-field sub-diffraction photolithography with an elastomeric photomask
title_full	Near-field sub-diffraction photolithography with an elastomeric photomask
title_fullStr	Near-field sub-diffraction photolithography with an elastomeric photomask
title_full_unstemmed	Near-field sub-diffraction photolithography with an elastomeric photomask
title_sort	near-field sub-diffraction photolithography with an elastomeric photomask
publisher	Nature Portfolio
publishDate	2020
url	https://doaj.org/article/1987c102c64a454185373731c0b8d245
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Near-field sub-diffraction photolithography with an elastomeric photomask

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