Changes of Crystal Structure and Microstructure of MoN Coatings in Accordance with Inductively Coupled Plasma Power
Nano-crystalline MoN coatings were prepared by inductively coupled plasma magnetron sputtering (ICPMS) according to changing the plasma power from 0 to 200 W. The properties of the coatings were analyzed by X-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, a na...
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| Format: | article |
| Langue: | EN |
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MDPI AG
2021
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| Accès en ligne: | https://doaj.org/article/19f9085a815246d8bcc90f02d45b5226 |
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| Résumé: | Nano-crystalline MoN coatings were prepared by inductively coupled plasma magnetron sputtering (ICPMS) according to changing the plasma power from 0 to 200 W. The properties of the coatings were analyzed by X-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, a nano-indentation tester, and a semiconductor characterization system. As the ICP power increased, the crystal structure of the MoN coatings was changed from a mixed phase of γ-Mo<sub>2</sub>N and α-Mo to a single phase of γ-Mo<sub>2</sub>N. The residual stress of the MoN coatings was also converted from tensile stress to compressive stress according to the increasing ICP power. As a result, the coatings deposited by the ICPMS have a very compact microstructure with high hardness: the nano-indentation hardness reached up to 27.1 GPa. The electrical resistivity of the coatings was decreased from 691.6 to 325.9 μΩ·cm as the ICP power increased as well. |
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