Changes of Crystal Structure and Microstructure of MoN Coatings in Accordance with Inductively Coupled Plasma Power

Nano-crystalline MoN coatings were prepared by inductively coupled plasma magnetron sputtering (ICPMS) according to changing the plasma power from 0 to 200 W. The properties of the coatings were analyzed by X-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, a na...

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Autor principal:	Sung-Yong Chun
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	molybdenum nitride inductively coupled plasma magnetron sputtering crystal structure residual stress resistivity Engineering (General). Civil engineering (General) TA1-2040
Acceso en línea:	https://doaj.org/article/19f9085a815246d8bcc90f02d45b5226
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spelling	oai:doaj.org-article:19f9085a815246d8bcc90f02d45b52262021-11-25T17:16:22ZChanges of Crystal Structure and Microstructure of MoN Coatings in Accordance with Inductively Coupled Plasma Power10.3390/coatings111113512079-6412https://doaj.org/article/19f9085a815246d8bcc90f02d45b52262021-11-01T00:00:00Zhttps://www.mdpi.com/2079-6412/11/11/1351https://doaj.org/toc/2079-6412Nano-crystalline MoN coatings were prepared by inductively coupled plasma magnetron sputtering (ICPMS) according to changing the plasma power from 0 to 200 W. The properties of the coatings were analyzed by X-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, a nano-indentation tester, and a semiconductor characterization system. As the ICP power increased, the crystal structure of the MoN coatings was changed from a mixed phase of γ-Mo<sub>2</sub>N and α-Mo to a single phase of γ-Mo<sub>2</sub>N. The residual stress of the MoN coatings was also converted from tensile stress to compressive stress according to the increasing ICP power. As a result, the coatings deposited by the ICPMS have a very compact microstructure with high hardness: the nano-indentation hardness reached up to 27.1 GPa. The electrical resistivity of the coatings was decreased from 691.6 to 325.9 μΩ·cm as the ICP power increased as well.Sung-Yong ChunMDPI AGarticlemolybdenum nitrideinductively coupled plasma magnetron sputteringcrystal structureresidual stressresistivityEngineering (General). Civil engineering (General)TA1-2040ENCoatings, Vol 11, Iss 1351, p 1351 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	molybdenum nitride inductively coupled plasma magnetron sputtering crystal structure residual stress resistivity Engineering (General). Civil engineering (General) TA1-2040
spellingShingle	molybdenum nitride inductively coupled plasma magnetron sputtering crystal structure residual stress resistivity Engineering (General). Civil engineering (General) TA1-2040 Sung-Yong Chun Changes of Crystal Structure and Microstructure of MoN Coatings in Accordance with Inductively Coupled Plasma Power
description	Nano-crystalline MoN coatings were prepared by inductively coupled plasma magnetron sputtering (ICPMS) according to changing the plasma power from 0 to 200 W. The properties of the coatings were analyzed by X-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, a nano-indentation tester, and a semiconductor characterization system. As the ICP power increased, the crystal structure of the MoN coatings was changed from a mixed phase of γ-Mo<sub>2</sub>N and α-Mo to a single phase of γ-Mo<sub>2</sub>N. The residual stress of the MoN coatings was also converted from tensile stress to compressive stress according to the increasing ICP power. As a result, the coatings deposited by the ICPMS have a very compact microstructure with high hardness: the nano-indentation hardness reached up to 27.1 GPa. The electrical resistivity of the coatings was decreased from 691.6 to 325.9 μΩ·cm as the ICP power increased as well.
format	article
author	Sung-Yong Chun
author_facet	Sung-Yong Chun
author_sort	Sung-Yong Chun
title	Changes of Crystal Structure and Microstructure of MoN Coatings in Accordance with Inductively Coupled Plasma Power
title_short	Changes of Crystal Structure and Microstructure of MoN Coatings in Accordance with Inductively Coupled Plasma Power
title_full	Changes of Crystal Structure and Microstructure of MoN Coatings in Accordance with Inductively Coupled Plasma Power
title_fullStr	Changes of Crystal Structure and Microstructure of MoN Coatings in Accordance with Inductively Coupled Plasma Power
title_full_unstemmed	Changes of Crystal Structure and Microstructure of MoN Coatings in Accordance with Inductively Coupled Plasma Power
title_sort	changes of crystal structure and microstructure of mon coatings in accordance with inductively coupled plasma power
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/19f9085a815246d8bcc90f02d45b5226
work_keys_str_mv	AT sungyongchun changesofcrystalstructureandmicrostructureofmoncoatingsinaccordancewithinductivelycoupledplasmapower
_version_	1718412514930196480

Changes of Crystal Structure and Microstructure of MoN Coatings in Accordance with Inductively Coupled Plasma Power

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