Scanning cathodoluminescence microscopy: applications in semiconductor and metallic nanostructures
Cathodoluminescence (CL) as a radiative light produced by an electron beam exciting a luminescent material, has been widely used in imaging and spectroscopic detection of semiconductor, mineral and biological samples with an ultrahigh spatial resolution. Conventional CL spectroscopy shows an excelle...
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Institue of Optics and Electronics, Chinese Academy of Sciences
2018
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oai:doaj.org-article:19fe21ddcb9d49a3a3e0ecdf06c7003a2021-11-11T10:07:47ZScanning cathodoluminescence microscopy: applications in semiconductor and metallic nanostructures2096-457910.29026/oea.2018.180007https://doaj.org/article/19fe21ddcb9d49a3a3e0ecdf06c7003a2018-02-01T00:00:00Zhttp://www.oejournal.org/article/doi/10.29026/oea.2018.180007https://doaj.org/toc/2096-4579Cathodoluminescence (CL) as a radiative light produced by an electron beam exciting a luminescent material, has been widely used in imaging and spectroscopic detection of semiconductor, mineral and biological samples with an ultrahigh spatial resolution. Conventional CL spectroscopy shows an excellent performance in characterization of traditional material luminescence, such as spatial composition variations and fluorescent displays. With the development of nanotechnology, advances of modern microscopy enable CL technique to obtain deep valuable insight of the testing sample, and further extend its applications in the material science, especially for opto-electronic investigations at nanoscale. In this article, we review the study of CL microscopy applied in semiconductor nanostructures for the dislocation, carrier diffusion, band structure, doping level and exciton recombination. Then advantages of CL in revealing and manipulating surface plasmon resonances of metallic nanoantennas are discussed. Finally, the challenge of CL technology is summarized, and potential CL applications for the future opto-electronic study are proposed.Liu ZhixinJiang MeilingHu YanglinLin FengShen BoZhu XingFang ZheyuInstitue of Optics and Electronics, Chinese Academy of Sciencesarticlecathodoluminescencemicroscopysemiconductormetallic nanostructuressurface plasmonsOptics. LightQC350-467ENOpto-Electronic Advances, Vol 1, Iss 4, Pp 180007-1-180007-11 (2018) |
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cathodoluminescence microscopy semiconductor metallic nanostructures surface plasmons Optics. Light QC350-467 |
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cathodoluminescence microscopy semiconductor metallic nanostructures surface plasmons Optics. Light QC350-467 Liu Zhixin Jiang Meiling Hu Yanglin Lin Feng Shen Bo Zhu Xing Fang Zheyu Scanning cathodoluminescence microscopy: applications in semiconductor and metallic nanostructures |
description |
Cathodoluminescence (CL) as a radiative light produced by an electron beam exciting a luminescent material, has been widely used in imaging and spectroscopic detection of semiconductor, mineral and biological samples with an ultrahigh spatial resolution. Conventional CL spectroscopy shows an excellent performance in characterization of traditional material luminescence, such as spatial composition variations and fluorescent displays. With the development of nanotechnology, advances of modern microscopy enable CL technique to obtain deep valuable insight of the testing sample, and further extend its applications in the material science, especially for opto-electronic investigations at nanoscale. In this article, we review the study of CL microscopy applied in semiconductor nanostructures for the dislocation, carrier diffusion, band structure, doping level and exciton recombination. Then advantages of CL in revealing and manipulating surface plasmon resonances of metallic nanoantennas are discussed. Finally, the challenge of CL technology is summarized, and potential CL applications for the future opto-electronic study are proposed. |
format |
article |
author |
Liu Zhixin Jiang Meiling Hu Yanglin Lin Feng Shen Bo Zhu Xing Fang Zheyu |
author_facet |
Liu Zhixin Jiang Meiling Hu Yanglin Lin Feng Shen Bo Zhu Xing Fang Zheyu |
author_sort |
Liu Zhixin |
title |
Scanning cathodoluminescence microscopy: applications in semiconductor and metallic nanostructures |
title_short |
Scanning cathodoluminescence microscopy: applications in semiconductor and metallic nanostructures |
title_full |
Scanning cathodoluminescence microscopy: applications in semiconductor and metallic nanostructures |
title_fullStr |
Scanning cathodoluminescence microscopy: applications in semiconductor and metallic nanostructures |
title_full_unstemmed |
Scanning cathodoluminescence microscopy: applications in semiconductor and metallic nanostructures |
title_sort |
scanning cathodoluminescence microscopy: applications in semiconductor and metallic nanostructures |
publisher |
Institue of Optics and Electronics, Chinese Academy of Sciences |
publishDate |
2018 |
url |
https://doaj.org/article/19fe21ddcb9d49a3a3e0ecdf06c7003a |
work_keys_str_mv |
AT liuzhixin scanningcathodoluminescencemicroscopyapplicationsinsemiconductorandmetallicnanostructures AT jiangmeiling scanningcathodoluminescencemicroscopyapplicationsinsemiconductorandmetallicnanostructures AT huyanglin scanningcathodoluminescencemicroscopyapplicationsinsemiconductorandmetallicnanostructures AT linfeng scanningcathodoluminescencemicroscopyapplicationsinsemiconductorandmetallicnanostructures AT shenbo scanningcathodoluminescencemicroscopyapplicationsinsemiconductorandmetallicnanostructures AT zhuxing scanningcathodoluminescencemicroscopyapplicationsinsemiconductorandmetallicnanostructures AT fangzheyu scanningcathodoluminescencemicroscopyapplicationsinsemiconductorandmetallicnanostructures |
_version_ |
1718439194168131584 |