Selective directed self-assembly of coexisting morphologies using block copolymer blends
There is a limited range of structures available in nanolithography using directed self-assembled block copolymers. Here, Black and co-workers expand directed self-assembly chemical patterning by using a blend of lamellar and cylinder forming block copolymers on surface chemical line gratings.
Guardado en:
Autores principales: | A. Stein, G. Wright, K. G. Yager, G. S. Doerk, C. T. Black |
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Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2016
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Materias: | |
Acceso en línea: | https://doaj.org/article/1c6b7b731c18441bb0c9f50eeceae810 |
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