Hydrogen-Free Carbon Films Deposited by a High Density Plasma Assisted Sputtering Source
Hydrogen-free carbon films were synthesized by a high density plasma assisted sputtering source (HiPASS). In the HiPASS a high density (> 1012 cm-3) remote Ar plasma was used to sputter a graphite cathode. As a direct current sputtering voltage was changed from -400 to -800 V the deposition r...
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| Autores principales: | , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
Japanese Society of Tribologists
2012
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| Acceso en línea: | https://doaj.org/article/1d85c4d684a140c981ae6099ef32e685 |
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