Scalable, highly stable Si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition

Authors demonstrate Si-based MIS photoanodes using Al thin-film reactions to create localized conduction paths through the insulator and Ni electrodeposition to form metal catalyst islands. These approaches yielded low onset potential, high saturation current density, and excellent stability.

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Autores principales: Soonil Lee, Li Ji, Alex C. De Palma, Edward T. Yu
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2021
Materias:
Q
Acceso en línea:https://doaj.org/article/1dd4494e46dc4cd5ac7bd47ee435223f
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spelling oai:doaj.org-article:1dd4494e46dc4cd5ac7bd47ee435223f2021-12-02T17:45:00ZScalable, highly stable Si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition10.1038/s41467-021-24229-y2041-1723https://doaj.org/article/1dd4494e46dc4cd5ac7bd47ee435223f2021-06-01T00:00:00Zhttps://doi.org/10.1038/s41467-021-24229-yhttps://doaj.org/toc/2041-1723Authors demonstrate Si-based MIS photoanodes using Al thin-film reactions to create localized conduction paths through the insulator and Ni electrodeposition to form metal catalyst islands. These approaches yielded low onset potential, high saturation current density, and excellent stability.Soonil LeeLi JiAlex C. De PalmaEdward T. YuNature PortfolioarticleScienceQENNature Communications, Vol 12, Iss 1, Pp 1-10 (2021)
institution DOAJ
collection DOAJ
language EN
topic Science
Q
spellingShingle Science
Q
Soonil Lee
Li Ji
Alex C. De Palma
Edward T. Yu
Scalable, highly stable Si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition
description Authors demonstrate Si-based MIS photoanodes using Al thin-film reactions to create localized conduction paths through the insulator and Ni electrodeposition to form metal catalyst islands. These approaches yielded low onset potential, high saturation current density, and excellent stability.
format article
author Soonil Lee
Li Ji
Alex C. De Palma
Edward T. Yu
author_facet Soonil Lee
Li Ji
Alex C. De Palma
Edward T. Yu
author_sort Soonil Lee
title Scalable, highly stable Si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition
title_short Scalable, highly stable Si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition
title_full Scalable, highly stable Si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition
title_fullStr Scalable, highly stable Si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition
title_full_unstemmed Scalable, highly stable Si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition
title_sort scalable, highly stable si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition
publisher Nature Portfolio
publishDate 2021
url https://doaj.org/article/1dd4494e46dc4cd5ac7bd47ee435223f
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AT alexcdepalma scalablehighlystablesibasedmetalinsulatorsemiconductorphotoanodesforwateroxidationfabricatedusingthinfilmreactionsandelectrodeposition
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