Two-terminal floating-gate memory with van der Waals heterostructures for ultrahigh on/off ratio

Traditional non-volatile memories suffer from poor scalability in the vertical direction due to the use of a bulky oxide layer. Here, the authors develop a tunnelling random access memory using a vertical heterostructure composed of atomically thin molybdenum disulfide, boron nitride and graphene.

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Auteurs principaux: Quoc An Vu, Yong Seon Shin, Young Rae Kim, Van Luan Nguyen, Won Tae Kang, Hyun Kim, Dinh Hoa Luong, Il Min Lee, Kiyoung Lee, Dong-Su Ko, Jinseong Heo, Seongjun Park, Young Hee Lee, Woo Jong Yu
Format: article
Langue:EN
Publié: Nature Portfolio 2016
Sujets:
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Accès en ligne:https://doaj.org/article/228e09379679498e976be30f4043dfb4
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