Process Parameters Optimization of Wet Shot Peening for Paint Cleaning

Wet shot peening (WSP) cleaning technology has the advantages of being green, having a high efficiency, and producing almost no pollution to the environment. Under the development trend of green environmental protection, WSP is more and more desired by the public. However, in the study of WSP cleani...

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Autores principales: Shuangshuang Wu, Xiujie Jia, Sheng Xiong, Fangyi Li, Mingliang Ma, Xing Wang, Chenghao Li
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Lenguaje:EN
Publicado: MDPI AG 2021
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Acceso en línea:https://doaj.org/article/251c450c69ee43c584fc3c14c6c2ebdb
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spelling oai:doaj.org-article:251c450c69ee43c584fc3c14c6c2ebdb2021-11-25T19:05:28ZProcess Parameters Optimization of Wet Shot Peening for Paint Cleaning10.3390/su1322129152071-1050https://doaj.org/article/251c450c69ee43c584fc3c14c6c2ebdb2021-11-01T00:00:00Zhttps://www.mdpi.com/2071-1050/13/22/12915https://doaj.org/toc/2071-1050Wet shot peening (WSP) cleaning technology has the advantages of being green, having a high efficiency, and producing almost no pollution to the environment. Under the development trend of green environmental protection, WSP is more and more desired by the public. However, in the study of WSP cleaning paint, there is little research on process parameter optimization. Accordingly, this article uses an orthogonal experiment, taking the cleaning efficiency and the substrate removal mass as objectives, to optimize the parameters of pressure, stand-off distance, traverse rate, and cleaning times. The experimental results show that the cleaning efficiency is improved by increasing the pressure, stand-off distance, and traverse rate or decreasing the cleaning times within the scope of this experiment. The pressure and cleaning times are positively correlated with the substrate removal mass, whereas the traverse rate is negatively correlated. As the stand-off distance increases, the substrate removal mass initially increases and then decreases. The traverse rate has a significant influence on the cleaning efficiency and the substrate removal mass. The optimal process parameters based on the cleaning efficiency are 0.45 MPa pressure, 140 mm stand-off distance, 5 mm/s traverse rate, and one-time cleaning. Besides, the cleaning efficiency at such conditions is 64.23 %/min. Additionally, the substrate removal mass is optimized under 0.25 MPa pressure, 60 mm (or 140 mm) stand-off distance, 5 mm/s traverse rate, and one-time cleaning to give a substrate removal mass of approximately zero. The analysis of parameters provides a reference for selecting the parameters in the actual application of WSP cleaning.Shuangshuang WuXiujie JiaSheng XiongFangyi LiMingliang MaXing WangChenghao LiMDPI AGarticlewet shot peening cleaningparameter optimizationcleaning efficiencyratioEnvironmental effects of industries and plantsTD194-195Renewable energy sourcesTJ807-830Environmental sciencesGE1-350ENSustainability, Vol 13, Iss 12915, p 12915 (2021)
institution DOAJ
collection DOAJ
language EN
topic wet shot peening cleaning
parameter optimization
cleaning efficiency
ratio
Environmental effects of industries and plants
TD194-195
Renewable energy sources
TJ807-830
Environmental sciences
GE1-350
spellingShingle wet shot peening cleaning
parameter optimization
cleaning efficiency
ratio
Environmental effects of industries and plants
TD194-195
Renewable energy sources
TJ807-830
Environmental sciences
GE1-350
Shuangshuang Wu
Xiujie Jia
Sheng Xiong
Fangyi Li
Mingliang Ma
Xing Wang
Chenghao Li
Process Parameters Optimization of Wet Shot Peening for Paint Cleaning
description Wet shot peening (WSP) cleaning technology has the advantages of being green, having a high efficiency, and producing almost no pollution to the environment. Under the development trend of green environmental protection, WSP is more and more desired by the public. However, in the study of WSP cleaning paint, there is little research on process parameter optimization. Accordingly, this article uses an orthogonal experiment, taking the cleaning efficiency and the substrate removal mass as objectives, to optimize the parameters of pressure, stand-off distance, traverse rate, and cleaning times. The experimental results show that the cleaning efficiency is improved by increasing the pressure, stand-off distance, and traverse rate or decreasing the cleaning times within the scope of this experiment. The pressure and cleaning times are positively correlated with the substrate removal mass, whereas the traverse rate is negatively correlated. As the stand-off distance increases, the substrate removal mass initially increases and then decreases. The traverse rate has a significant influence on the cleaning efficiency and the substrate removal mass. The optimal process parameters based on the cleaning efficiency are 0.45 MPa pressure, 140 mm stand-off distance, 5 mm/s traverse rate, and one-time cleaning. Besides, the cleaning efficiency at such conditions is 64.23 %/min. Additionally, the substrate removal mass is optimized under 0.25 MPa pressure, 60 mm (or 140 mm) stand-off distance, 5 mm/s traverse rate, and one-time cleaning to give a substrate removal mass of approximately zero. The analysis of parameters provides a reference for selecting the parameters in the actual application of WSP cleaning.
format article
author Shuangshuang Wu
Xiujie Jia
Sheng Xiong
Fangyi Li
Mingliang Ma
Xing Wang
Chenghao Li
author_facet Shuangshuang Wu
Xiujie Jia
Sheng Xiong
Fangyi Li
Mingliang Ma
Xing Wang
Chenghao Li
author_sort Shuangshuang Wu
title Process Parameters Optimization of Wet Shot Peening for Paint Cleaning
title_short Process Parameters Optimization of Wet Shot Peening for Paint Cleaning
title_full Process Parameters Optimization of Wet Shot Peening for Paint Cleaning
title_fullStr Process Parameters Optimization of Wet Shot Peening for Paint Cleaning
title_full_unstemmed Process Parameters Optimization of Wet Shot Peening for Paint Cleaning
title_sort process parameters optimization of wet shot peening for paint cleaning
publisher MDPI AG
publishDate 2021
url https://doaj.org/article/251c450c69ee43c584fc3c14c6c2ebdb
work_keys_str_mv AT shuangshuangwu processparametersoptimizationofwetshotpeeningforpaintcleaning
AT xiujiejia processparametersoptimizationofwetshotpeeningforpaintcleaning
AT shengxiong processparametersoptimizationofwetshotpeeningforpaintcleaning
AT fangyili processparametersoptimizationofwetshotpeeningforpaintcleaning
AT mingliangma processparametersoptimizationofwetshotpeeningforpaintcleaning
AT xingwang processparametersoptimizationofwetshotpeeningforpaintcleaning
AT chenghaoli processparametersoptimizationofwetshotpeeningforpaintcleaning
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