Quantum–continuum simulation of underpotential deposition at electrified metal–solution interfaces
Thin films: How to overachieve at underpotentials The deposition of atomically thin metal films can be predicted with a comprehensive model incorporating realistic environmental factors. Nanomaterials used as catalysts and sensors are often produced by the spontaneous attachment of metal ions onto i...
Guardado en:
| Autores principales: | , |
|---|---|
| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
Nature Portfolio
2017
|
| Materias: | |
| Acceso en línea: | https://doaj.org/article/2589ceb82c3d406488ee08147fef90cc |
| Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
Sea el primero en dejar un comentario!