Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

Block copolymers that form nanodomains and are used in nanolithography usually do not form nanopatterns with multiple shapes. Here the authors report a block copolymer that allows for UV- induced cleavage of one arm and demonstrate the transformation of the cylindrical to the lamellar nanodomain.

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Autores principales:	Chungryong Choi, Jichoel Park, Kanniyambatti L. Vincent Joseph, Jaeyong Lee, Seonghyeon Ahn, Jongheon Kwak, Kyu Seong Lee, Jin Kon Kim
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2017
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/28d8523d6a88453cb29e5dc13c663c6c
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spelling	oai:doaj.org-article:28d8523d6a88453cb29e5dc13c663c6c2021-12-02T15:37:07ZSimultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker10.1038/s41467-017-02019-92041-1723https://doaj.org/article/28d8523d6a88453cb29e5dc13c663c6c2017-11-01T00:00:00Zhttps://doi.org/10.1038/s41467-017-02019-9https://doaj.org/toc/2041-1723Block copolymers that form nanodomains and are used in nanolithography usually do not form nanopatterns with multiple shapes. Here the authors report a block copolymer that allows for UV- induced cleavage of one arm and demonstrate the transformation of the cylindrical to the lamellar nanodomain.Chungryong ChoiJichoel ParkKanniyambatti L. Vincent JosephJaeyong LeeSeonghyeon AhnJongheon KwakKyu Seong LeeJin Kon KimNature PortfolioarticleScienceQENNature Communications, Vol 8, Iss 1, Pp 1-8 (2017)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Chungryong Choi Jichoel Park Kanniyambatti L. Vincent Joseph Jaeyong Lee Seonghyeon Ahn Jongheon Kwak Kyu Seong Lee Jin Kon Kim Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker
description	Block copolymers that form nanodomains and are used in nanolithography usually do not form nanopatterns with multiple shapes. Here the authors report a block copolymer that allows for UV- induced cleavage of one arm and demonstrate the transformation of the cylindrical to the lamellar nanodomain.
format	article
author	Chungryong Choi Jichoel Park Kanniyambatti L. Vincent Joseph Jaeyong Lee Seonghyeon Ahn Jongheon Kwak Kyu Seong Lee Jin Kon Kim
author_facet	Chungryong Choi Jichoel Park Kanniyambatti L. Vincent Joseph Jaeyong Lee Seonghyeon Ahn Jongheon Kwak Kyu Seong Lee Jin Kon Kim
author_sort	Chungryong Choi
title	Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker
title_short	Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker
title_full	Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker
title_fullStr	Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker
title_full_unstemmed	Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker
title_sort	simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker
publisher	Nature Portfolio
publishDate	2017
url	https://doaj.org/article/28d8523d6a88453cb29e5dc13c663c6c
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Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

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