Unprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution

Abstract Silicon-based implantable neural devices have great translational potential as a means to deliver various treatments for neurological disorders. However, they are currently held back by uncertain longevity following chronic exposure to body fluids. Conventional deposition techniques cover o...

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Autores principales:	Pejman Ghelich, Nicholas F. Nolta, Martin Han
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Materials of engineering and construction. Mechanics of materials TA401-492
Acceso en línea:	https://doaj.org/article/2e460bce8b024e6292d44da6807374d4
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id	oai:doaj.org-article:2e460bce8b024e6292d44da6807374d4
record_format	dspace
spelling	oai:doaj.org-article:2e460bce8b024e6292d44da6807374d42021-12-02T14:27:00ZUnprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution10.1038/s41529-021-00154-92397-2106https://doaj.org/article/2e460bce8b024e6292d44da6807374d42021-02-01T00:00:00Zhttps://doi.org/10.1038/s41529-021-00154-9https://doaj.org/toc/2397-2106Abstract Silicon-based implantable neural devices have great translational potential as a means to deliver various treatments for neurological disorders. However, they are currently held back by uncertain longevity following chronic exposure to body fluids. Conventional deposition techniques cover only the horizontal surfaces which contain active electronics, electrode sites, and conducting traces. As a result, a vast majority of today’s silicon devices leave their vertical sidewalls exposed without protection. In this work, we investigated two batch-process silicon dioxide deposition methods separately and in combination: atomic layer deposition and inductively-coupled plasma chemical vapor deposition. We then utilized a rapid soak test involving potassium hydroxide to evaluate the coverage quality of each protection strategy. Focused ion beam cross sectioning, scanning electron microscopy, and 3D extrapolation enabled us to characterize and quantify the effectiveness of the deposition methods. Results showed that bare silicon sidewalls suffered the most dissolution whereas ALD silicon dioxide provided the best protection, demonstrating its effectiveness as a promising batch process technique to mitigate silicon sidewall corrosion in chronic applications.Pejman GhelichNicholas F. NoltaMartin HanNature PortfolioarticleMaterials of engineering and construction. Mechanics of materialsTA401-492ENnpj Materials Degradation, Vol 5, Iss 1, Pp 1-8 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Materials of engineering and construction. Mechanics of materials TA401-492
spellingShingle	Materials of engineering and construction. Mechanics of materials TA401-492 Pejman Ghelich Nicholas F. Nolta Martin Han Unprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution
description	Abstract Silicon-based implantable neural devices have great translational potential as a means to deliver various treatments for neurological disorders. However, they are currently held back by uncertain longevity following chronic exposure to body fluids. Conventional deposition techniques cover only the horizontal surfaces which contain active electronics, electrode sites, and conducting traces. As a result, a vast majority of today’s silicon devices leave their vertical sidewalls exposed without protection. In this work, we investigated two batch-process silicon dioxide deposition methods separately and in combination: atomic layer deposition and inductively-coupled plasma chemical vapor deposition. We then utilized a rapid soak test involving potassium hydroxide to evaluate the coverage quality of each protection strategy. Focused ion beam cross sectioning, scanning electron microscopy, and 3D extrapolation enabled us to characterize and quantify the effectiveness of the deposition methods. Results showed that bare silicon sidewalls suffered the most dissolution whereas ALD silicon dioxide provided the best protection, demonstrating its effectiveness as a promising batch process technique to mitigate silicon sidewall corrosion in chronic applications.
format	article
author	Pejman Ghelich Nicholas F. Nolta Martin Han
author_facet	Pejman Ghelich Nicholas F. Nolta Martin Han
author_sort	Pejman Ghelich
title	Unprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution
title_short	Unprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution
title_full	Unprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution
title_fullStr	Unprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution
title_full_unstemmed	Unprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution
title_sort	unprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/2e460bce8b024e6292d44da6807374d4
work_keys_str_mv	AT pejmanghelich unprotectedsidewallsofimplantablesiliconbasedneuralprobesandconformalcoatingasasolution AT nicholasfnolta unprotectedsidewallsofimplantablesiliconbasedneuralprobesandconformalcoatingasasolution AT martinhan unprotectedsidewallsofimplantablesiliconbasedneuralprobesandconformalcoatingasasolution
_version_	1718391301239472128

Unprotected sidewalls of implantable silicon-based neural probes and conformal coating as a solution

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