Radiation Hardness Property of Ultra-Fast 3D-Trench Electrode Silicon Detector on N-Type Substrate

The radiation fluence of high luminosity LHC (HL-LHC) is predicted up to 1 × 10<sup>16</sup> 1 MeV n<sub>eq</sub>/cm<sup>2</sup> in the ATLAS and CMS experiments for the pixel detectors at the innermost layers. The increased radiation leads to the degradation of t...

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Autores principales: Manwen Liu, Xinqing Li, Wenzheng Cheng, Zheng Li, Zhihua Li
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Publicado: MDPI AG 2021
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spelling oai:doaj.org-article:372f006d7ac5498ba46dcfc7287c18c72021-11-25T18:23:42ZRadiation Hardness Property of Ultra-Fast 3D-Trench Electrode Silicon Detector on N-Type Substrate10.3390/mi121114002072-666Xhttps://doaj.org/article/372f006d7ac5498ba46dcfc7287c18c72021-11-01T00:00:00Zhttps://www.mdpi.com/2072-666X/12/11/1400https://doaj.org/toc/2072-666XThe radiation fluence of high luminosity LHC (HL-LHC) is predicted up to 1 × 10<sup>16</sup> 1 MeV n<sub>eq</sub>/cm<sup>2</sup> in the ATLAS and CMS experiments for the pixel detectors at the innermost layers. The increased radiation leads to the degradation of the detector properties, such as increased leakage current and full depletion voltage, and reduced signals and charge collection efficiency, which means it is necessary to develop the radiation hard semiconductor devices for very high luminosity colliders. In our previous study about ultra-fast 3D-trench electrode silicon detectors, through induced transient current simulation with different minimum ionizing particle (MIP) hitting positions, the ultra-fast response times ranging from 30 ps to 140 ps were verified. In this work, the full depletion voltage, breakdown voltage, leakage current, capacitance, weighting field and MIP induced transient current (signal) of the detector after radiation at different fluences will be simulated and calculated with professional software, namely the finite-element Technology Computer-Aided Design (TCAD) software frameworks. From analysis of the simulation results, one can predict the performance of the detector in heavy radiation environment. The fabrication of pixel detectors will be carried out in CMOS process platform of IMECAS based on ultra-pure high resistivity (up to 10<sup>4</sup> ohm·cm) silicon material.Manwen LiuXinqing LiWenzheng ChengZheng LiZhihua LiMDPI AGarticleultra-fast 3D-trench electrode silicon detectorfull depletion voltagebreakdown voltageleakage currentcapacitanceweighting fieldMechanical engineering and machineryTJ1-1570ENMicromachines, Vol 12, Iss 1400, p 1400 (2021)
institution DOAJ
collection DOAJ
language EN
topic ultra-fast 3D-trench electrode silicon detector
full depletion voltage
breakdown voltage
leakage current
capacitance
weighting field
Mechanical engineering and machinery
TJ1-1570
spellingShingle ultra-fast 3D-trench electrode silicon detector
full depletion voltage
breakdown voltage
leakage current
capacitance
weighting field
Mechanical engineering and machinery
TJ1-1570
Manwen Liu
Xinqing Li
Wenzheng Cheng
Zheng Li
Zhihua Li
Radiation Hardness Property of Ultra-Fast 3D-Trench Electrode Silicon Detector on N-Type Substrate
description The radiation fluence of high luminosity LHC (HL-LHC) is predicted up to 1 × 10<sup>16</sup> 1 MeV n<sub>eq</sub>/cm<sup>2</sup> in the ATLAS and CMS experiments for the pixel detectors at the innermost layers. The increased radiation leads to the degradation of the detector properties, such as increased leakage current and full depletion voltage, and reduced signals and charge collection efficiency, which means it is necessary to develop the radiation hard semiconductor devices for very high luminosity colliders. In our previous study about ultra-fast 3D-trench electrode silicon detectors, through induced transient current simulation with different minimum ionizing particle (MIP) hitting positions, the ultra-fast response times ranging from 30 ps to 140 ps were verified. In this work, the full depletion voltage, breakdown voltage, leakage current, capacitance, weighting field and MIP induced transient current (signal) of the detector after radiation at different fluences will be simulated and calculated with professional software, namely the finite-element Technology Computer-Aided Design (TCAD) software frameworks. From analysis of the simulation results, one can predict the performance of the detector in heavy radiation environment. The fabrication of pixel detectors will be carried out in CMOS process platform of IMECAS based on ultra-pure high resistivity (up to 10<sup>4</sup> ohm·cm) silicon material.
format article
author Manwen Liu
Xinqing Li
Wenzheng Cheng
Zheng Li
Zhihua Li
author_facet Manwen Liu
Xinqing Li
Wenzheng Cheng
Zheng Li
Zhihua Li
author_sort Manwen Liu
title Radiation Hardness Property of Ultra-Fast 3D-Trench Electrode Silicon Detector on N-Type Substrate
title_short Radiation Hardness Property of Ultra-Fast 3D-Trench Electrode Silicon Detector on N-Type Substrate
title_full Radiation Hardness Property of Ultra-Fast 3D-Trench Electrode Silicon Detector on N-Type Substrate
title_fullStr Radiation Hardness Property of Ultra-Fast 3D-Trench Electrode Silicon Detector on N-Type Substrate
title_full_unstemmed Radiation Hardness Property of Ultra-Fast 3D-Trench Electrode Silicon Detector on N-Type Substrate
title_sort radiation hardness property of ultra-fast 3d-trench electrode silicon detector on n-type substrate
publisher MDPI AG
publishDate 2021
url https://doaj.org/article/372f006d7ac5498ba46dcfc7287c18c7
work_keys_str_mv AT manwenliu radiationhardnesspropertyofultrafast3dtrenchelectrodesilicondetectoronntypesubstrate
AT xinqingli radiationhardnesspropertyofultrafast3dtrenchelectrodesilicondetectoronntypesubstrate
AT wenzhengcheng radiationhardnesspropertyofultrafast3dtrenchelectrodesilicondetectoronntypesubstrate
AT zhengli radiationhardnesspropertyofultrafast3dtrenchelectrodesilicondetectoronntypesubstrate
AT zhihuali radiationhardnesspropertyofultrafast3dtrenchelectrodesilicondetectoronntypesubstrate
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