Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma
In this study, amorphous hydrogenated carbon (a-C:H) and Si-doped diamond-like carbon (Si-DLC) films were prepared using microwave sheath voltage combination plasma (MVP) deposition. The thermal stability of the a-C:H and Si-DLC films were investigated by performing an annealing test (100-700&de...
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| Autores principales: | , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
Japanese Society of Tribologists
2013
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/39c36a38fdaf4a3ba41d90319ad18923 |
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| Sumario: | In this study, amorphous hydrogenated carbon (a-C:H) and Si-doped diamond-like carbon (Si-DLC) films were prepared using microwave sheath voltage combination plasma (MVP) deposition. The thermal stability of the a-C:H and Si-DLC films were investigated by performing an annealing test (100-700°C) in ambient air. Furthermore, the in situ high-temperature tribological properties on the films were investigated by performing a sliding test against a Si3N4 ball at high temperatures (100, 200, and 300°C). Hardness measurements and a tribological test showed that Si-DLC has better thermal stability than a-C:H; however, Si-DLC has a higher friction coefficient and undergoes more wear than does a-C:H in the in situ high-temperature tribological test. Therefore, the failure of Si-DLC is due to adhesive wear, whereas that of a-C:H is due to abrasive wear. |
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