Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma

In this study, amorphous hydrogenated carbon (a-C:H) and Si-doped diamond-like carbon (Si-DLC) films were prepared using microwave sheath voltage combination plasma (MVP) deposition. The thermal stability of the a-C:H and Si-DLC films were investigated by performing an annealing test (100-700&de...

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Autores principales: Xingrui Deng, Hiroyuki Kousaka, Takayuki Tokoroyama, Noritsugu Umehara
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Lenguaje:EN
Publicado: Japanese Society of Tribologists 2013
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Acceso en línea:https://doaj.org/article/39c36a38fdaf4a3ba41d90319ad18923
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spelling oai:doaj.org-article:39c36a38fdaf4a3ba41d90319ad189232021-11-05T09:24:08ZThermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma1881-219810.2474/trol.8.257https://doaj.org/article/39c36a38fdaf4a3ba41d90319ad189232013-09-01T00:00:00Zhttps://www.jstage.jst.go.jp/article/trol/8/4/8_257/_pdf/-char/enhttps://doaj.org/toc/1881-2198In this study, amorphous hydrogenated carbon (a-C:H) and Si-doped diamond-like carbon (Si-DLC) films were prepared using microwave sheath voltage combination plasma (MVP) deposition. The thermal stability of the a-C:H and Si-DLC films were investigated by performing an annealing test (100-700°C) in ambient air. Furthermore, the in situ high-temperature tribological properties on the films were investigated by performing a sliding test against a Si3N4 ball at high temperatures (100, 200, and 300°C). Hardness measurements and a tribological test showed that Si-DLC has better thermal stability than a-C:H; however, Si-DLC has a higher friction coefficient and undergoes more wear than does a-C:H in the in situ high-temperature tribological test. Therefore, the failure of Si-DLC is due to adhesive wear, whereas that of a-C:H is due to abrasive wear.Xingrui DengHiroyuki KousakaTakayuki TokoroyamaNoritsugu UmeharaJapanese Society of Tribologistsarticlediamond-like carbon microwave sheath voltage combination plasmathermal stabilityin situ high-temperature tribological propertiesPhysicsQC1-999Engineering (General). Civil engineering (General)TA1-2040Mechanical engineering and machineryTJ1-1570ChemistryQD1-999ENTribology Online, Vol 8, Iss 4, Pp 257-264 (2013)
institution DOAJ
collection DOAJ
language EN
topic diamond-like carbon
microwave sheath voltage combination plasma
thermal stability
in situ high-temperature tribological properties
Physics
QC1-999
Engineering (General). Civil engineering (General)
TA1-2040
Mechanical engineering and machinery
TJ1-1570
Chemistry
QD1-999
spellingShingle diamond-like carbon
microwave sheath voltage combination plasma
thermal stability
in situ high-temperature tribological properties
Physics
QC1-999
Engineering (General). Civil engineering (General)
TA1-2040
Mechanical engineering and machinery
TJ1-1570
Chemistry
QD1-999
Xingrui Deng
Hiroyuki Kousaka
Takayuki Tokoroyama
Noritsugu Umehara
Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma
description In this study, amorphous hydrogenated carbon (a-C:H) and Si-doped diamond-like carbon (Si-DLC) films were prepared using microwave sheath voltage combination plasma (MVP) deposition. The thermal stability of the a-C:H and Si-DLC films were investigated by performing an annealing test (100-700°C) in ambient air. Furthermore, the in situ high-temperature tribological properties on the films were investigated by performing a sliding test against a Si3N4 ball at high temperatures (100, 200, and 300°C). Hardness measurements and a tribological test showed that Si-DLC has better thermal stability than a-C:H; however, Si-DLC has a higher friction coefficient and undergoes more wear than does a-C:H in the in situ high-temperature tribological test. Therefore, the failure of Si-DLC is due to adhesive wear, whereas that of a-C:H is due to abrasive wear.
format article
author Xingrui Deng
Hiroyuki Kousaka
Takayuki Tokoroyama
Noritsugu Umehara
author_facet Xingrui Deng
Hiroyuki Kousaka
Takayuki Tokoroyama
Noritsugu Umehara
author_sort Xingrui Deng
title Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma
title_short Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma
title_full Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma
title_fullStr Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma
title_full_unstemmed Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma
title_sort thermal stability and high-temperature tribological properties of a-c:h and si-dlc deposited by microwave sheath voltage combination plasma
publisher Japanese Society of Tribologists
publishDate 2013
url https://doaj.org/article/39c36a38fdaf4a3ba41d90319ad18923
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