Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma
In this study, amorphous hydrogenated carbon (a-C:H) and Si-doped diamond-like carbon (Si-DLC) films were prepared using microwave sheath voltage combination plasma (MVP) deposition. The thermal stability of the a-C:H and Si-DLC films were investigated by performing an annealing test (100-700&de...
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Japanese Society of Tribologists
2013
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oai:doaj.org-article:39c36a38fdaf4a3ba41d90319ad189232021-11-05T09:24:08ZThermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma1881-219810.2474/trol.8.257https://doaj.org/article/39c36a38fdaf4a3ba41d90319ad189232013-09-01T00:00:00Zhttps://www.jstage.jst.go.jp/article/trol/8/4/8_257/_pdf/-char/enhttps://doaj.org/toc/1881-2198In this study, amorphous hydrogenated carbon (a-C:H) and Si-doped diamond-like carbon (Si-DLC) films were prepared using microwave sheath voltage combination plasma (MVP) deposition. The thermal stability of the a-C:H and Si-DLC films were investigated by performing an annealing test (100-700°C) in ambient air. Furthermore, the in situ high-temperature tribological properties on the films were investigated by performing a sliding test against a Si3N4 ball at high temperatures (100, 200, and 300°C). Hardness measurements and a tribological test showed that Si-DLC has better thermal stability than a-C:H; however, Si-DLC has a higher friction coefficient and undergoes more wear than does a-C:H in the in situ high-temperature tribological test. Therefore, the failure of Si-DLC is due to adhesive wear, whereas that of a-C:H is due to abrasive wear.Xingrui DengHiroyuki KousakaTakayuki TokoroyamaNoritsugu UmeharaJapanese Society of Tribologistsarticlediamond-like carbon microwave sheath voltage combination plasmathermal stabilityin situ high-temperature tribological propertiesPhysicsQC1-999Engineering (General). Civil engineering (General)TA1-2040Mechanical engineering and machineryTJ1-1570ChemistryQD1-999ENTribology Online, Vol 8, Iss 4, Pp 257-264 (2013) |
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diamond-like carbon microwave sheath voltage combination plasma thermal stability in situ high-temperature tribological properties Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999 |
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diamond-like carbon microwave sheath voltage combination plasma thermal stability in situ high-temperature tribological properties Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999 Xingrui Deng Hiroyuki Kousaka Takayuki Tokoroyama Noritsugu Umehara Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma |
description |
In this study, amorphous hydrogenated carbon (a-C:H) and Si-doped diamond-like carbon (Si-DLC) films were prepared using microwave sheath voltage combination plasma (MVP) deposition. The thermal stability of the a-C:H and Si-DLC films were investigated by performing an annealing test (100-700°C) in ambient air. Furthermore, the in situ high-temperature tribological properties on the films were investigated by performing a sliding test against a Si3N4 ball at high temperatures (100, 200, and 300°C). Hardness measurements and a tribological test showed that Si-DLC has better thermal stability than a-C:H; however, Si-DLC has a higher friction coefficient and undergoes more wear than does a-C:H in the in situ high-temperature tribological test. Therefore, the failure of Si-DLC is due to adhesive wear, whereas that of a-C:H is due to abrasive wear. |
format |
article |
author |
Xingrui Deng Hiroyuki Kousaka Takayuki Tokoroyama Noritsugu Umehara |
author_facet |
Xingrui Deng Hiroyuki Kousaka Takayuki Tokoroyama Noritsugu Umehara |
author_sort |
Xingrui Deng |
title |
Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma |
title_short |
Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma |
title_full |
Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma |
title_fullStr |
Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma |
title_full_unstemmed |
Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma |
title_sort |
thermal stability and high-temperature tribological properties of a-c:h and si-dlc deposited by microwave sheath voltage combination plasma |
publisher |
Japanese Society of Tribologists |
publishDate |
2013 |
url |
https://doaj.org/article/39c36a38fdaf4a3ba41d90319ad18923 |
work_keys_str_mv |
AT xingruideng thermalstabilityandhightemperaturetribologicalpropertiesofachandsidlcdepositedbymicrowavesheathvoltagecombinationplasma AT hiroyukikousaka thermalstabilityandhightemperaturetribologicalpropertiesofachandsidlcdepositedbymicrowavesheathvoltagecombinationplasma AT takayukitokoroyama thermalstabilityandhightemperaturetribologicalpropertiesofachandsidlcdepositedbymicrowavesheathvoltagecombinationplasma AT noritsuguumehara thermalstabilityandhightemperaturetribologicalpropertiesofachandsidlcdepositedbymicrowavesheathvoltagecombinationplasma |
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