Kim, T., Oh, C., Park, S. H., Lee, J. W., Lee, S. I., & Kim, B. S. (2021). Electrical properties of low-temperature SiO2 thin films prepared by plasma-enhanced atomic layer deposition with different plasma times. AIP Publishing LLC.
Style de citation Chicago (17e éd.)Kim, Taehyeon, Changyong Oh, So Hee Park, Joo Won Lee, Sang Ik Lee, et Bo Sung Kim. Electrical Properties of Low-temperature SiO2 Thin Films Prepared by Plasma-enhanced Atomic Layer Deposition with Different Plasma Times. AIP Publishing LLC, 2021.
Style de citation MLA (8e éd.)Kim, Taehyeon, et al. Electrical Properties of Low-temperature SiO2 Thin Films Prepared by Plasma-enhanced Atomic Layer Deposition with Different Plasma Times. AIP Publishing LLC, 2021.
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