APA (7th ed.) Citation

Kim, T., Oh, C., Park, S. H., Lee, J. W., Lee, S. I., & Kim, B. S. (2021). Electrical properties of low-temperature SiO2 thin films prepared by plasma-enhanced atomic layer deposition with different plasma times. AIP Publishing LLC.

Chicago Style (17th ed.) Citation

Kim, Taehyeon, Changyong Oh, So Hee Park, Joo Won Lee, Sang Ik Lee, and Bo Sung Kim. Electrical Properties of Low-temperature SiO2 Thin Films Prepared by Plasma-enhanced Atomic Layer Deposition with Different Plasma Times. AIP Publishing LLC, 2021.

MLA (8th ed.) Citation

Kim, Taehyeon, et al. Electrical Properties of Low-temperature SiO2 Thin Films Prepared by Plasma-enhanced Atomic Layer Deposition with Different Plasma Times. AIP Publishing LLC, 2021.