Cita APA (7a ed.)

Kim, T., Oh, C., Park, S. H., Lee, J. W., Lee, S. I., & Kim, B. S. (2021). Electrical properties of low-temperature SiO2 thin films prepared by plasma-enhanced atomic layer deposition with different plasma times. AIP Publishing LLC.

Cita Chicago Style (17a ed.)

Kim, Taehyeon, Changyong Oh, So Hee Park, Joo Won Lee, Sang Ik Lee, y Bo Sung Kim. Electrical Properties of Low-temperature SiO2 Thin Films Prepared by Plasma-enhanced Atomic Layer Deposition with Different Plasma Times. AIP Publishing LLC, 2021.

Cita MLA (8a ed.)

Kim, Taehyeon, et al. Electrical Properties of Low-temperature SiO2 Thin Films Prepared by Plasma-enhanced Atomic Layer Deposition with Different Plasma Times. AIP Publishing LLC, 2021.