Cita APA (7a ed.)

Kun, P., Fülöp, B., Dobrik, G., Nemes-Incze, P., Lukács, I. E., Csonka, S., . . . Tapasztó, L. (2020). Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography. Nature Portfolio.

Cita Chicago Style (17a ed.)

Kun, Péter, Bálint Fülöp, Gergely Dobrik, Péter Nemes-Incze, István Endre Lukács, Szabolcs Csonka, Chanyong Hwang, y Levente Tapasztó. Robust Quantum Point Contact Operation of Narrow Graphene Constrictions Patterned by AFM Cleavage Lithography. Nature Portfolio, 2020.

Cita MLA (8a ed.)

Kun, Péter, et al. Robust Quantum Point Contact Operation of Narrow Graphene Constrictions Patterned by AFM Cleavage Lithography. Nature Portfolio, 2020.