Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography

Abstract Detecting conductance quantization in graphene nanostructures turned out more challenging than expected. The observation of well-defined conductance plateaus through graphene nanoconstrictions so far has only been accessible in the highest quality suspended or h-BN encapsulated devices. How...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	Péter Kun, Bálint Fülöp, Gergely Dobrik, Péter Nemes-Incze, István Endre Lukács, Szabolcs Csonka, Chanyong Hwang, Levente Tapasztó
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2020
Materias:	Materials of engineering and construction. Mechanics of materials TA401-492 Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/3b8e848fd197431aae41bb5701894b93
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

id	oai:doaj.org-article:3b8e848fd197431aae41bb5701894b93
record_format	dspace
spelling	oai:doaj.org-article:3b8e848fd197431aae41bb5701894b932021-12-02T13:41:48ZRobust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography10.1038/s41699-020-00177-x2397-7132https://doaj.org/article/3b8e848fd197431aae41bb5701894b932020-12-01T00:00:00Zhttps://doi.org/10.1038/s41699-020-00177-xhttps://doaj.org/toc/2397-7132Abstract Detecting conductance quantization in graphene nanostructures turned out more challenging than expected. The observation of well-defined conductance plateaus through graphene nanoconstrictions so far has only been accessible in the highest quality suspended or h-BN encapsulated devices. However, reaching low conductance quanta in zero magnetic field, is a delicate task even with such ultra-high mobility devices. Here, we demonstrate a simple AFM-based nanopatterning technique for defining graphene constrictions with high precision (down to 10 nm width) and reduced edge-roughness (+/−1 nm). The patterning process is based on the in-plane mechanical cleavage of graphene by the AFM tip, along its high symmetry crystallographic directions. As-defined, narrow graphene constrictions with improved edge quality enable an unprecedentedly robust QPC operation, allowing the observation of conductance quantization even on standard SiO2/Si substrates, down to low conductance quanta. Conductance plateaus, were observed at n × e2/h, evenly spaced by 2 × e 2 /h (corresponding to n = 3, 5, 7, 9, 11) in the absence of an external magnetic field, while spaced by e 2 /h (n = 1, 2, 3, 4, 5, 6) in 8 T magnetic field.Péter KunBálint FülöpGergely DobrikPéter Nemes-InczeIstván Endre LukácsSzabolcs CsonkaChanyong HwangLevente TapasztóNature PortfolioarticleMaterials of engineering and construction. Mechanics of materialsTA401-492ChemistryQD1-999ENnpj 2D Materials and Applications, Vol 4, Iss 1, Pp 1-6 (2020)
institution	DOAJ
collection	DOAJ
language	EN
topic	Materials of engineering and construction. Mechanics of materials TA401-492 Chemistry QD1-999
spellingShingle	Materials of engineering and construction. Mechanics of materials TA401-492 Chemistry QD1-999 Péter Kun Bálint Fülöp Gergely Dobrik Péter Nemes-Incze István Endre Lukács Szabolcs Csonka Chanyong Hwang Levente Tapasztó Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography
description	Abstract Detecting conductance quantization in graphene nanostructures turned out more challenging than expected. The observation of well-defined conductance plateaus through graphene nanoconstrictions so far has only been accessible in the highest quality suspended or h-BN encapsulated devices. However, reaching low conductance quanta in zero magnetic field, is a delicate task even with such ultra-high mobility devices. Here, we demonstrate a simple AFM-based nanopatterning technique for defining graphene constrictions with high precision (down to 10 nm width) and reduced edge-roughness (+/−1 nm). The patterning process is based on the in-plane mechanical cleavage of graphene by the AFM tip, along its high symmetry crystallographic directions. As-defined, narrow graphene constrictions with improved edge quality enable an unprecedentedly robust QPC operation, allowing the observation of conductance quantization even on standard SiO2/Si substrates, down to low conductance quanta. Conductance plateaus, were observed at n × e2/h, evenly spaced by 2 × e 2 /h (corresponding to n = 3, 5, 7, 9, 11) in the absence of an external magnetic field, while spaced by e 2 /h (n = 1, 2, 3, 4, 5, 6) in 8 T magnetic field.
format	article
author	Péter Kun Bálint Fülöp Gergely Dobrik Péter Nemes-Incze István Endre Lukács Szabolcs Csonka Chanyong Hwang Levente Tapasztó
author_facet	Péter Kun Bálint Fülöp Gergely Dobrik Péter Nemes-Incze István Endre Lukács Szabolcs Csonka Chanyong Hwang Levente Tapasztó
author_sort	Péter Kun
title	Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography
title_short	Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography
title_full	Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography
title_fullStr	Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography
title_full_unstemmed	Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography
title_sort	robust quantum point contact operation of narrow graphene constrictions patterned by afm cleavage lithography
publisher	Nature Portfolio
publishDate	2020
url	https://doaj.org/article/3b8e848fd197431aae41bb5701894b93
work_keys_str_mv	AT peterkun robustquantumpointcontactoperationofnarrowgrapheneconstrictionspatternedbyafmcleavagelithography AT balintfulop robustquantumpointcontactoperationofnarrowgrapheneconstrictionspatternedbyafmcleavagelithography AT gergelydobrik robustquantumpointcontactoperationofnarrowgrapheneconstrictionspatternedbyafmcleavagelithography AT peternemesincze robustquantumpointcontactoperationofnarrowgrapheneconstrictionspatternedbyafmcleavagelithography AT istvanendrelukacs robustquantumpointcontactoperationofnarrowgrapheneconstrictionspatternedbyafmcleavagelithography AT szabolcscsonka robustquantumpointcontactoperationofnarrowgrapheneconstrictionspatternedbyafmcleavagelithography AT chanyonghwang robustquantumpointcontactoperationofnarrowgrapheneconstrictionspatternedbyafmcleavagelithography AT leventetapaszto robustquantumpointcontactoperationofnarrowgrapheneconstrictionspatternedbyafmcleavagelithography
_version_	1718392550254968832

Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography

Ejemplares similares