Precise Measurement of Clearance between Two Substrates Using Evanescent Waves

In the material designing process of footwear outer-soles, the rubber grip property under lubricated conditions is important. Generally, friction behaviors of rubber under such conditions are influenced by contact states, which can be changed by various factors, i.e. viscosity, sliding velocity, nor...

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Autores principales:	Toshiaki Nishi, Kenta Moriyasu, Tsuyoshi Nishiwaki
Formato:	article
Lenguaje:	EN
Publicado:	Japanese Society of Tribologists 2017
Materias:	in-situ measuring method contact condition evanescent field total reflection method light interferometry Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/3e85a12e356c4ab88f93bb6ef33f383f
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id	oai:doaj.org-article:3e85a12e356c4ab88f93bb6ef33f383f
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spelling	oai:doaj.org-article:3e85a12e356c4ab88f93bb6ef33f383f2021-11-05T09:19:54ZPrecise Measurement of Clearance between Two Substrates Using Evanescent Waves1881-219810.2474/trol.12.251https://doaj.org/article/3e85a12e356c4ab88f93bb6ef33f383f2017-11-01T00:00:00Zhttps://www.jstage.jst.go.jp/article/trol/12/5/12_251/_pdf/-char/enhttps://doaj.org/toc/1881-2198In the material designing process of footwear outer-soles, the rubber grip property under lubricated conditions is important. Generally, friction behaviors of rubber under such conditions are influenced by contact states, which can be changed by various factors, i.e. viscosity, sliding velocity, normal force, surface roughness and wettability between two substrates. To discuss the influences of each parameter, the contact conditions are investigated. The purpose of this study is to establish a new method to measure the distributions of real contact area and film thickness between two substrates based on the decay behavior of an evanescent field in a total reflection method. In conclusion, film thickness was measured with an accuracy of 1 nm in a range of clearance of less than 800 nm.Toshiaki NishiKenta MoriyasuTsuyoshi NishiwakiJapanese Society of Tribologistsarticlein-situ measuring methodcontact conditionevanescent fieldtotal reflection methodlight interferometryPhysicsQC1-999Engineering (General). Civil engineering (General)TA1-2040Mechanical engineering and machineryTJ1-1570ChemistryQD1-999ENTribology Online, Vol 12, Iss 5, Pp 251-256 (2017)
institution	DOAJ
collection	DOAJ
language	EN
topic	in-situ measuring method contact condition evanescent field total reflection method light interferometry Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999
spellingShingle	in-situ measuring method contact condition evanescent field total reflection method light interferometry Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999 Toshiaki Nishi Kenta Moriyasu Tsuyoshi Nishiwaki Precise Measurement of Clearance between Two Substrates Using Evanescent Waves
description	In the material designing process of footwear outer-soles, the rubber grip property under lubricated conditions is important. Generally, friction behaviors of rubber under such conditions are influenced by contact states, which can be changed by various factors, i.e. viscosity, sliding velocity, normal force, surface roughness and wettability between two substrates. To discuss the influences of each parameter, the contact conditions are investigated. The purpose of this study is to establish a new method to measure the distributions of real contact area and film thickness between two substrates based on the decay behavior of an evanescent field in a total reflection method. In conclusion, film thickness was measured with an accuracy of 1 nm in a range of clearance of less than 800 nm.
format	article
author	Toshiaki Nishi Kenta Moriyasu Tsuyoshi Nishiwaki
author_facet	Toshiaki Nishi Kenta Moriyasu Tsuyoshi Nishiwaki
author_sort	Toshiaki Nishi
title	Precise Measurement of Clearance between Two Substrates Using Evanescent Waves
title_short	Precise Measurement of Clearance between Two Substrates Using Evanescent Waves
title_full	Precise Measurement of Clearance between Two Substrates Using Evanescent Waves
title_fullStr	Precise Measurement of Clearance between Two Substrates Using Evanescent Waves
title_full_unstemmed	Precise Measurement of Clearance between Two Substrates Using Evanescent Waves
title_sort	precise measurement of clearance between two substrates using evanescent waves
publisher	Japanese Society of Tribologists
publishDate	2017
url	https://doaj.org/article/3e85a12e356c4ab88f93bb6ef33f383f
work_keys_str_mv	AT toshiakinishi precisemeasurementofclearancebetweentwosubstratesusingevanescentwaves AT kentamoriyasu precisemeasurementofclearancebetweentwosubstratesusingevanescentwaves AT tsuyoshinishiwaki precisemeasurementofclearancebetweentwosubstratesusingevanescentwaves
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Precise Measurement of Clearance between Two Substrates Using Evanescent Waves

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