Tailoring atomic layer growth at the liquid-metal interface

Ultrathin metallic films are most often fabricated by atomic or molecular beam epitaxy under ultrahigh vacuum conditions, where it is difficult to control deposition and growth. Here, the authors describe a wet deposition method, using solution-borne gold nanocluster precursors, to regulate growth o...

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Autores principales:	Hai Cao, Deepali Waghray, Stefan Knoppe, Wim Dehaen, Thierry Verbiest, Steven De Feyter
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2018
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/41b41169f3d14a169b5ce1fe237c3a19
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spelling	oai:doaj.org-article:41b41169f3d14a169b5ce1fe237c3a192021-12-02T16:56:44ZTailoring atomic layer growth at the liquid-metal interface10.1038/s41467-018-07381-w2041-1723https://doaj.org/article/41b41169f3d14a169b5ce1fe237c3a192018-11-01T00:00:00Zhttps://doi.org/10.1038/s41467-018-07381-whttps://doaj.org/toc/2041-1723Ultrathin metallic films are most often fabricated by atomic or molecular beam epitaxy under ultrahigh vacuum conditions, where it is difficult to control deposition and growth. Here, the authors describe a wet deposition method, using solution-borne gold nanocluster precursors, to regulate growth of atomically flat gold nanoislands on a surface.Hai CaoDeepali WaghrayStefan KnoppeWim DehaenThierry VerbiestSteven De FeyterNature PortfolioarticleScienceQENNature Communications, Vol 9, Iss 1, Pp 1-10 (2018)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Hai Cao Deepali Waghray Stefan Knoppe Wim Dehaen Thierry Verbiest Steven De Feyter Tailoring atomic layer growth at the liquid-metal interface
description	Ultrathin metallic films are most often fabricated by atomic or molecular beam epitaxy under ultrahigh vacuum conditions, where it is difficult to control deposition and growth. Here, the authors describe a wet deposition method, using solution-borne gold nanocluster precursors, to regulate growth of atomically flat gold nanoislands on a surface.
format	article
author	Hai Cao Deepali Waghray Stefan Knoppe Wim Dehaen Thierry Verbiest Steven De Feyter
author_facet	Hai Cao Deepali Waghray Stefan Knoppe Wim Dehaen Thierry Verbiest Steven De Feyter
author_sort	Hai Cao
title	Tailoring atomic layer growth at the liquid-metal interface
title_short	Tailoring atomic layer growth at the liquid-metal interface
title_full	Tailoring atomic layer growth at the liquid-metal interface
title_fullStr	Tailoring atomic layer growth at the liquid-metal interface
title_full_unstemmed	Tailoring atomic layer growth at the liquid-metal interface
title_sort	tailoring atomic layer growth at the liquid-metal interface
publisher	Nature Portfolio
publishDate	2018
url	https://doaj.org/article/41b41169f3d14a169b5ce1fe237c3a19
work_keys_str_mv	AT haicao tailoringatomiclayergrowthattheliquidmetalinterface AT deepaliwaghray tailoringatomiclayergrowthattheliquidmetalinterface AT stefanknoppe tailoringatomiclayergrowthattheliquidmetalinterface AT wimdehaen tailoringatomiclayergrowthattheliquidmetalinterface AT thierryverbiest tailoringatomiclayergrowthattheliquidmetalinterface AT stevendefeyter tailoringatomiclayergrowthattheliquidmetalinterface
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Tailoring atomic layer growth at the liquid-metal interface

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