Tailoring atomic layer growth at the liquid-metal interface

Ultrathin metallic films are most often fabricated by atomic or molecular beam epitaxy under ultrahigh vacuum conditions, where it is difficult to control deposition and growth. Here, the authors describe a wet deposition method, using solution-borne gold nanocluster precursors, to regulate growth o...

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Main Authors: Hai Cao, Deepali Waghray, Stefan Knoppe, Wim Dehaen, Thierry Verbiest, Steven De Feyter
Format: article
Language:EN
Published: Nature Portfolio 2018
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Online Access:https://doaj.org/article/41b41169f3d14a169b5ce1fe237c3a19
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spelling oai:doaj.org-article:41b41169f3d14a169b5ce1fe237c3a192021-12-02T16:56:44ZTailoring atomic layer growth at the liquid-metal interface10.1038/s41467-018-07381-w2041-1723https://doaj.org/article/41b41169f3d14a169b5ce1fe237c3a192018-11-01T00:00:00Zhttps://doi.org/10.1038/s41467-018-07381-whttps://doaj.org/toc/2041-1723Ultrathin metallic films are most often fabricated by atomic or molecular beam epitaxy under ultrahigh vacuum conditions, where it is difficult to control deposition and growth. Here, the authors describe a wet deposition method, using solution-borne gold nanocluster precursors, to regulate growth of atomically flat gold nanoislands on a surface.Hai CaoDeepali WaghrayStefan KnoppeWim DehaenThierry VerbiestSteven De FeyterNature PortfolioarticleScienceQENNature Communications, Vol 9, Iss 1, Pp 1-10 (2018)
institution DOAJ
collection DOAJ
language EN
topic Science
Q
spellingShingle Science
Q
Hai Cao
Deepali Waghray
Stefan Knoppe
Wim Dehaen
Thierry Verbiest
Steven De Feyter
Tailoring atomic layer growth at the liquid-metal interface
description Ultrathin metallic films are most often fabricated by atomic or molecular beam epitaxy under ultrahigh vacuum conditions, where it is difficult to control deposition and growth. Here, the authors describe a wet deposition method, using solution-borne gold nanocluster precursors, to regulate growth of atomically flat gold nanoislands on a surface.
format article
author Hai Cao
Deepali Waghray
Stefan Knoppe
Wim Dehaen
Thierry Verbiest
Steven De Feyter
author_facet Hai Cao
Deepali Waghray
Stefan Knoppe
Wim Dehaen
Thierry Verbiest
Steven De Feyter
author_sort Hai Cao
title Tailoring atomic layer growth at the liquid-metal interface
title_short Tailoring atomic layer growth at the liquid-metal interface
title_full Tailoring atomic layer growth at the liquid-metal interface
title_fullStr Tailoring atomic layer growth at the liquid-metal interface
title_full_unstemmed Tailoring atomic layer growth at the liquid-metal interface
title_sort tailoring atomic layer growth at the liquid-metal interface
publisher Nature Portfolio
publishDate 2018
url https://doaj.org/article/41b41169f3d14a169b5ce1fe237c3a19
work_keys_str_mv AT haicao tailoringatomiclayergrowthattheliquidmetalinterface
AT deepaliwaghray tailoringatomiclayergrowthattheliquidmetalinterface
AT stefanknoppe tailoringatomiclayergrowthattheliquidmetalinterface
AT wimdehaen tailoringatomiclayergrowthattheliquidmetalinterface
AT thierryverbiest tailoringatomiclayergrowthattheliquidmetalinterface
AT stevendefeyter tailoringatomiclayergrowthattheliquidmetalinterface
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