Tailoring atomic layer growth at the liquid-metal interface

Ultrathin metallic films are most often fabricated by atomic or molecular beam epitaxy under ultrahigh vacuum conditions, where it is difficult to control deposition and growth. Here, the authors describe a wet deposition method, using solution-borne gold nanocluster precursors, to regulate growth o...

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Autores principales: Hai Cao, Deepali Waghray, Stefan Knoppe, Wim Dehaen, Thierry Verbiest, Steven De Feyter
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2018
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Acceso en línea:https://doaj.org/article/41b41169f3d14a169b5ce1fe237c3a19
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