Mechanism of Perfluoropolyether Chains Bonding on Carbon Overcoat Surface by Ultraviolet Irradiation

To elucidate the bonding mechanism of a non-polar perfluoropolyether lubricant (PFPE lube) under ultraviolet (UV) irradiation, the UV wavelength ranges in which photoelectrons emanate were identified using photoelectron spectroscopy in air (PESA), and the bonding behavior of the lube at various UV w...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	Takayuki Nakakawaji, Mina Amo, Hiroyuki Matsumoto, Teiji Kato, Ken-ichi Iimura
Formato:	article
Lenguaje:	EN
Publicado:	Japanese Society of Tribologists 2009
Materias:	hard disk perfluoropolyether uv irradiation photoelectron photo-dissociation Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/425ed3b25abe4d29b62740b413c40221
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

id	oai:doaj.org-article:425ed3b25abe4d29b62740b413c40221
record_format	dspace
spelling	oai:doaj.org-article:425ed3b25abe4d29b62740b413c402212021-11-05T09:27:55ZMechanism of Perfluoropolyether Chains Bonding on Carbon Overcoat Surface by Ultraviolet Irradiation1881-219810.2474/trol.4.88https://doaj.org/article/425ed3b25abe4d29b62740b413c402212009-07-01T00:00:00Zhttps://www.jstage.jst.go.jp/article/trol/4/4/4_4_88/_pdf/-char/enhttps://doaj.org/toc/1881-2198To elucidate the bonding mechanism of a non-polar perfluoropolyether lubricant (PFPE lube) under ultraviolet (UV) irradiation, the UV wavelength ranges in which photoelectrons emanate were identified using photoelectron spectroscopy in air (PESA), and the bonding behavior of the lube at various UV wavelengths was studied. The results showed that photoelectrons emanated from magnetic disk substrates at wavelengths of 240 nm or less and the lube was bonded to the substrate in the wavelength range where photoelectrons were emanated. For comparison, Si, SiO2/Si, and Si3N4/Si were also used as substrate; the Si substrate which emanated the highest photoelectron intensity showed the highest bonded ratio of the lube. The lube, however, also bonded to the SiO2/Si and Si3N4/Si substrates under UV irradiation at 222 nm, where photoelectrons do not emanate from the substrates. These observations suggest that the bonding mechanism between the PFPE chains and the carbon overcoat (COC) surfaces under UV irradiation was affected by factors other than photoelectrons.Takayuki NakakawajiMina AmoHiroyuki MatsumotoTeiji KatoKen-ichi IimuraJapanese Society of Tribologistsarticlehard diskperfluoropolyetheruv irradiationphotoelectronphoto-dissociationPhysicsQC1-999Engineering (General). Civil engineering (General)TA1-2040Mechanical engineering and machineryTJ1-1570ChemistryQD1-999ENTribology Online, Vol 4, Iss 4, Pp 88-91 (2009)
institution	DOAJ
collection	DOAJ
language	EN
topic	hard disk perfluoropolyether uv irradiation photoelectron photo-dissociation Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999
spellingShingle	hard disk perfluoropolyether uv irradiation photoelectron photo-dissociation Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999 Takayuki Nakakawaji Mina Amo Hiroyuki Matsumoto Teiji Kato Ken-ichi Iimura Mechanism of Perfluoropolyether Chains Bonding on Carbon Overcoat Surface by Ultraviolet Irradiation
description	To elucidate the bonding mechanism of a non-polar perfluoropolyether lubricant (PFPE lube) under ultraviolet (UV) irradiation, the UV wavelength ranges in which photoelectrons emanate were identified using photoelectron spectroscopy in air (PESA), and the bonding behavior of the lube at various UV wavelengths was studied. The results showed that photoelectrons emanated from magnetic disk substrates at wavelengths of 240 nm or less and the lube was bonded to the substrate in the wavelength range where photoelectrons were emanated. For comparison, Si, SiO2/Si, and Si3N4/Si were also used as substrate; the Si substrate which emanated the highest photoelectron intensity showed the highest bonded ratio of the lube. The lube, however, also bonded to the SiO2/Si and Si3N4/Si substrates under UV irradiation at 222 nm, where photoelectrons do not emanate from the substrates. These observations suggest that the bonding mechanism between the PFPE chains and the carbon overcoat (COC) surfaces under UV irradiation was affected by factors other than photoelectrons.
format	article
author	Takayuki Nakakawaji Mina Amo Hiroyuki Matsumoto Teiji Kato Ken-ichi Iimura
author_facet	Takayuki Nakakawaji Mina Amo Hiroyuki Matsumoto Teiji Kato Ken-ichi Iimura
author_sort	Takayuki Nakakawaji
title	Mechanism of Perfluoropolyether Chains Bonding on Carbon Overcoat Surface by Ultraviolet Irradiation
title_short	Mechanism of Perfluoropolyether Chains Bonding on Carbon Overcoat Surface by Ultraviolet Irradiation
title_full	Mechanism of Perfluoropolyether Chains Bonding on Carbon Overcoat Surface by Ultraviolet Irradiation
title_fullStr	Mechanism of Perfluoropolyether Chains Bonding on Carbon Overcoat Surface by Ultraviolet Irradiation
title_full_unstemmed	Mechanism of Perfluoropolyether Chains Bonding on Carbon Overcoat Surface by Ultraviolet Irradiation
title_sort	mechanism of perfluoropolyether chains bonding on carbon overcoat surface by ultraviolet irradiation
publisher	Japanese Society of Tribologists
publishDate	2009
url	https://doaj.org/article/425ed3b25abe4d29b62740b413c40221
work_keys_str_mv	AT takayukinakakawaji mechanismofperfluoropolyetherchainsbondingoncarbonovercoatsurfacebyultravioletirradiation AT minaamo mechanismofperfluoropolyetherchainsbondingoncarbonovercoatsurfacebyultravioletirradiation AT hiroyukimatsumoto mechanismofperfluoropolyetherchainsbondingoncarbonovercoatsurfacebyultravioletirradiation AT teijikato mechanismofperfluoropolyetherchainsbondingoncarbonovercoatsurfacebyultravioletirradiation AT kenichiiimura mechanismofperfluoropolyetherchainsbondingoncarbonovercoatsurfacebyultravioletirradiation
_version_	1718444344197775360

Mechanism of Perfluoropolyether Chains Bonding on Carbon Overcoat Surface by Ultraviolet Irradiation

Ejemplares similares