Water-Soluble Epitaxial NaCl Thin Film for Fabrication of Flexible Devices

Abstract We studied growth mechanisms of water-soluble NaCl thin films on single crystal substrates. Epitaxial growth of NaCl(100) on Si(100) and domain-matched growth of NaCl(111) on c-sapphire were obtained at thicknesses below 100 nm even at room temperature from low lattice mismatches in both ca...

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Autores principales: Dong Kyu Lee, Sungjoo Kim, Sein Oh, Jae-Young Choi, Jong-Lam Lee, Hak Ki Yu
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2017
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Acceso en línea:https://doaj.org/article/43bf4c9fa7d34efcb2a5024ca01c66a2
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Sumario:Abstract We studied growth mechanisms of water-soluble NaCl thin films on single crystal substrates. Epitaxial growth of NaCl(100) on Si(100) and domain-matched growth of NaCl(111) on c-sapphire were obtained at thicknesses below 100 nm even at room temperature from low lattice mismatches in both cases. NaCl thin film, which demonstrates high solubility selectivity for water, was successfully applied as a water-soluble sacrificial layer for fabrication of several functional materials, such as WO3 nano-helix and Sn doped In2O3 nano-branches.