Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip

This paper presents a simple and reliable routine for batch fabrication of wear-resistant and conductive probe with a PtSi tip. The fabrication process is based on inductively coupled plasma (ICP) etching, metal evaporation, and annealing. Si tips with curvature radii less than 10 nm were produced w...

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Autores principales: Meijie Liu, Yinfang Zhu, Junyuan Zhao, Lihao Wang, Jinling Yang, Fuhua Yang
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
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Acceso en línea:https://doaj.org/article/4cda81b875d74320a25dccf2f5d59eef
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spelling oai:doaj.org-article:4cda81b875d74320a25dccf2f5d59eef2021-11-25T18:23:09ZBatch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip10.3390/mi121113262072-666Xhttps://doaj.org/article/4cda81b875d74320a25dccf2f5d59eef2021-10-01T00:00:00Zhttps://www.mdpi.com/2072-666X/12/11/1326https://doaj.org/toc/2072-666XThis paper presents a simple and reliable routine for batch fabrication of wear-resistant and conductive probe with a PtSi tip. The fabrication process is based on inductively coupled plasma (ICP) etching, metal evaporation, and annealing. Si tips with curvature radii less than 10 nm were produced with good wafer-level uniformity using isotropic etching and thermal oxygen sharpening. The surface roughness of the etched tip post was reduced by optimized isotropic etching. The dependence of the platinum silicide morphology on annealing conditions were also systematically investigated, and conductive and wear-resistant probes with PtSi tips of curvature radii less than 30 nm were batch fabricated and applied for scanning piezoelectric samples.Meijie LiuYinfang ZhuJunyuan ZhaoLihao WangJinling YangFuhua YangMDPI AGarticleICP isotropic etchingannealingwear-resistantPtSi tipMechanical engineering and machineryTJ1-1570ENMicromachines, Vol 12, Iss 1326, p 1326 (2021)
institution DOAJ
collection DOAJ
language EN
topic ICP isotropic etching
annealing
wear-resistant
PtSi tip
Mechanical engineering and machinery
TJ1-1570
spellingShingle ICP isotropic etching
annealing
wear-resistant
PtSi tip
Mechanical engineering and machinery
TJ1-1570
Meijie Liu
Yinfang Zhu
Junyuan Zhao
Lihao Wang
Jinling Yang
Fuhua Yang
Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip
description This paper presents a simple and reliable routine for batch fabrication of wear-resistant and conductive probe with a PtSi tip. The fabrication process is based on inductively coupled plasma (ICP) etching, metal evaporation, and annealing. Si tips with curvature radii less than 10 nm were produced with good wafer-level uniformity using isotropic etching and thermal oxygen sharpening. The surface roughness of the etched tip post was reduced by optimized isotropic etching. The dependence of the platinum silicide morphology on annealing conditions were also systematically investigated, and conductive and wear-resistant probes with PtSi tips of curvature radii less than 30 nm were batch fabricated and applied for scanning piezoelectric samples.
format article
author Meijie Liu
Yinfang Zhu
Junyuan Zhao
Lihao Wang
Jinling Yang
Fuhua Yang
author_facet Meijie Liu
Yinfang Zhu
Junyuan Zhao
Lihao Wang
Jinling Yang
Fuhua Yang
author_sort Meijie Liu
title Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip
title_short Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip
title_full Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip
title_fullStr Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip
title_full_unstemmed Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip
title_sort batch fabrication of wear-resistant and conductive probe with ptsi tip
publisher MDPI AG
publishDate 2021
url https://doaj.org/article/4cda81b875d74320a25dccf2f5d59eef
work_keys_str_mv AT meijieliu batchfabricationofwearresistantandconductiveprobewithptsitip
AT yinfangzhu batchfabricationofwearresistantandconductiveprobewithptsitip
AT junyuanzhao batchfabricationofwearresistantandconductiveprobewithptsitip
AT lihaowang batchfabricationofwearresistantandconductiveprobewithptsitip
AT jinlingyang batchfabricationofwearresistantandconductiveprobewithptsitip
AT fuhuayang batchfabricationofwearresistantandconductiveprobewithptsitip
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