Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip
This paper presents a simple and reliable routine for batch fabrication of wear-resistant and conductive probe with a PtSi tip. The fabrication process is based on inductively coupled plasma (ICP) etching, metal evaporation, and annealing. Si tips with curvature radii less than 10 nm were produced w...
Guardado en:
Autores principales: | , , , , , |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
MDPI AG
2021
|
Materias: | |
Acceso en línea: | https://doaj.org/article/4cda81b875d74320a25dccf2f5d59eef |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
id |
oai:doaj.org-article:4cda81b875d74320a25dccf2f5d59eef |
---|---|
record_format |
dspace |
spelling |
oai:doaj.org-article:4cda81b875d74320a25dccf2f5d59eef2021-11-25T18:23:09ZBatch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip10.3390/mi121113262072-666Xhttps://doaj.org/article/4cda81b875d74320a25dccf2f5d59eef2021-10-01T00:00:00Zhttps://www.mdpi.com/2072-666X/12/11/1326https://doaj.org/toc/2072-666XThis paper presents a simple and reliable routine for batch fabrication of wear-resistant and conductive probe with a PtSi tip. The fabrication process is based on inductively coupled plasma (ICP) etching, metal evaporation, and annealing. Si tips with curvature radii less than 10 nm were produced with good wafer-level uniformity using isotropic etching and thermal oxygen sharpening. The surface roughness of the etched tip post was reduced by optimized isotropic etching. The dependence of the platinum silicide morphology on annealing conditions were also systematically investigated, and conductive and wear-resistant probes with PtSi tips of curvature radii less than 30 nm were batch fabricated and applied for scanning piezoelectric samples.Meijie LiuYinfang ZhuJunyuan ZhaoLihao WangJinling YangFuhua YangMDPI AGarticleICP isotropic etchingannealingwear-resistantPtSi tipMechanical engineering and machineryTJ1-1570ENMicromachines, Vol 12, Iss 1326, p 1326 (2021) |
institution |
DOAJ |
collection |
DOAJ |
language |
EN |
topic |
ICP isotropic etching annealing wear-resistant PtSi tip Mechanical engineering and machinery TJ1-1570 |
spellingShingle |
ICP isotropic etching annealing wear-resistant PtSi tip Mechanical engineering and machinery TJ1-1570 Meijie Liu Yinfang Zhu Junyuan Zhao Lihao Wang Jinling Yang Fuhua Yang Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip |
description |
This paper presents a simple and reliable routine for batch fabrication of wear-resistant and conductive probe with a PtSi tip. The fabrication process is based on inductively coupled plasma (ICP) etching, metal evaporation, and annealing. Si tips with curvature radii less than 10 nm were produced with good wafer-level uniformity using isotropic etching and thermal oxygen sharpening. The surface roughness of the etched tip post was reduced by optimized isotropic etching. The dependence of the platinum silicide morphology on annealing conditions were also systematically investigated, and conductive and wear-resistant probes with PtSi tips of curvature radii less than 30 nm were batch fabricated and applied for scanning piezoelectric samples. |
format |
article |
author |
Meijie Liu Yinfang Zhu Junyuan Zhao Lihao Wang Jinling Yang Fuhua Yang |
author_facet |
Meijie Liu Yinfang Zhu Junyuan Zhao Lihao Wang Jinling Yang Fuhua Yang |
author_sort |
Meijie Liu |
title |
Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip |
title_short |
Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip |
title_full |
Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip |
title_fullStr |
Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip |
title_full_unstemmed |
Batch Fabrication of Wear-Resistant and Conductive Probe with PtSi Tip |
title_sort |
batch fabrication of wear-resistant and conductive probe with ptsi tip |
publisher |
MDPI AG |
publishDate |
2021 |
url |
https://doaj.org/article/4cda81b875d74320a25dccf2f5d59eef |
work_keys_str_mv |
AT meijieliu batchfabricationofwearresistantandconductiveprobewithptsitip AT yinfangzhu batchfabricationofwearresistantandconductiveprobewithptsitip AT junyuanzhao batchfabricationofwearresistantandconductiveprobewithptsitip AT lihaowang batchfabricationofwearresistantandconductiveprobewithptsitip AT jinlingyang batchfabricationofwearresistantandconductiveprobewithptsitip AT fuhuayang batchfabricationofwearresistantandconductiveprobewithptsitip |
_version_ |
1718411254145482752 |