Remarkably High Mobility Thin-Film Transistor on Flexible Substrate by Novel Passivation Material

Abstract High mobility thin-film transistor (TFT) is crucial for future high resolution and fast response flexible display. Remarkably high performance TFT, made at room temperature on flexible substrate, is achieved with record high field-effect mobility (μ FE ) of 345 cm2/Vs, small sub-threshold s...

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Autores principales: Cheng Wei Shih, Albert Chin
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2017
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Acceso en línea:https://doaj.org/article/4e92c6b22aef4247b4f672579fed4d0d
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spelling oai:doaj.org-article:4e92c6b22aef4247b4f672579fed4d0d2021-12-02T15:06:13ZRemarkably High Mobility Thin-Film Transistor on Flexible Substrate by Novel Passivation Material10.1038/s41598-017-01231-32045-2322https://doaj.org/article/4e92c6b22aef4247b4f672579fed4d0d2017-04-01T00:00:00Zhttps://doi.org/10.1038/s41598-017-01231-3https://doaj.org/toc/2045-2322Abstract High mobility thin-film transistor (TFT) is crucial for future high resolution and fast response flexible display. Remarkably high performance TFT, made at room temperature on flexible substrate, is achieved with record high field-effect mobility (μ FE ) of 345 cm2/Vs, small sub-threshold slope (SS) of 103 mV/dec, high on-current/off-current (I ON /I OFF ) of 7 × 106, and a low drain-voltage (VD) of 2 V for low power operation. The achieved mobility is the best reported data among flexible electronic devices, which is reached by novel HfLaO passivation material on nano-crystalline zinc-oxide (ZnO) TFT to improve both I ON and I OFF . From X-ray photoelectron spectroscopy (XPS) analysis, the non-passivated device has high OH-bonding intensity in nano-crystalline ZnO, which damage the crystallinity, create charged scattering centers, and form potential barriers to degrade mobility.Cheng Wei ShihAlbert ChinNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 7, Iss 1, Pp 1-8 (2017)
institution DOAJ
collection DOAJ
language EN
topic Medicine
R
Science
Q
spellingShingle Medicine
R
Science
Q
Cheng Wei Shih
Albert Chin
Remarkably High Mobility Thin-Film Transistor on Flexible Substrate by Novel Passivation Material
description Abstract High mobility thin-film transistor (TFT) is crucial for future high resolution and fast response flexible display. Remarkably high performance TFT, made at room temperature on flexible substrate, is achieved with record high field-effect mobility (μ FE ) of 345 cm2/Vs, small sub-threshold slope (SS) of 103 mV/dec, high on-current/off-current (I ON /I OFF ) of 7 × 106, and a low drain-voltage (VD) of 2 V for low power operation. The achieved mobility is the best reported data among flexible electronic devices, which is reached by novel HfLaO passivation material on nano-crystalline zinc-oxide (ZnO) TFT to improve both I ON and I OFF . From X-ray photoelectron spectroscopy (XPS) analysis, the non-passivated device has high OH-bonding intensity in nano-crystalline ZnO, which damage the crystallinity, create charged scattering centers, and form potential barriers to degrade mobility.
format article
author Cheng Wei Shih
Albert Chin
author_facet Cheng Wei Shih
Albert Chin
author_sort Cheng Wei Shih
title Remarkably High Mobility Thin-Film Transistor on Flexible Substrate by Novel Passivation Material
title_short Remarkably High Mobility Thin-Film Transistor on Flexible Substrate by Novel Passivation Material
title_full Remarkably High Mobility Thin-Film Transistor on Flexible Substrate by Novel Passivation Material
title_fullStr Remarkably High Mobility Thin-Film Transistor on Flexible Substrate by Novel Passivation Material
title_full_unstemmed Remarkably High Mobility Thin-Film Transistor on Flexible Substrate by Novel Passivation Material
title_sort remarkably high mobility thin-film transistor on flexible substrate by novel passivation material
publisher Nature Portfolio
publishDate 2017
url https://doaj.org/article/4e92c6b22aef4247b4f672579fed4d0d
work_keys_str_mv AT chengweishih remarkablyhighmobilitythinfilmtransistoronflexiblesubstratebynovelpassivationmaterial
AT albertchin remarkablyhighmobilitythinfilmtransistoronflexiblesubstratebynovelpassivationmaterial
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