Atomic Layer Deposition of ZrO2 on Titanium Inhibits Bacterial Adhesion and Enhances Osteoblast Viability

Yujin Jo,1 Yong Tae Kim,2 Hoonsung Cho,2 Min-Kyung Ji,3 Jaeyeong Heo,2,3 Hyun-Pil Lim1 1Department of Prosthodontics, School of Dentistry, Chonnam National University, Gwangju, Korea; 2Department of Materials Science and Engineering, Chonnam National University, Gwangju, 61186, Korea; 3Optoelectroni...

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Autores principales: Jo Y, Kim YT, Cho H, Ji MK, Heo J, Lim HP
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Publicado: Dove Medical Press 2021
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spelling oai:doaj.org-article:4f7b85d6d2954f728a3be103a35325172021-12-02T18:17:07ZAtomic Layer Deposition of ZrO2 on Titanium Inhibits Bacterial Adhesion and Enhances Osteoblast Viability1178-2013https://doaj.org/article/4f7b85d6d2954f728a3be103a35325172021-02-01T00:00:00Zhttps://www.dovepress.com/atomic-layer-deposition-of-zro2-on-titanium-inhibits-bacterial-adhesio-peer-reviewed-article-IJNhttps://doaj.org/toc/1178-2013Yujin Jo,1 Yong Tae Kim,2 Hoonsung Cho,2 Min-Kyung Ji,3 Jaeyeong Heo,2,3 Hyun-Pil Lim1 1Department of Prosthodontics, School of Dentistry, Chonnam National University, Gwangju, Korea; 2Department of Materials Science and Engineering, Chonnam National University, Gwangju, 61186, Korea; 3Optoelectronics Convergence Research Center, Chonnam National University, Gwangju, 61186, Republic of KoreaCorrespondence: Hyun-Pil LimDepartment of Prosthodontics, School of Dentistry, Chonnam National University, Gwangju, 61186, KoreaTel +82-10-2645-7528Fax +82-62-530-5577Email mcnihil@jnu.ac.krJaeyeong HeoDepartment of Materials Science and Engineering, Chonnam National University, Gwangju, 61186, KoreaTel +82-62-530-1716Fax +82-62-530-1699Email jheo@jnu.ac.krPurpose: The study was intended to create a uniform zirconia layer even on the surface of complex structures via atomic layer deposition (ALD). The impact of crystalline zirconia deposited by ALD on bacterial adhesion and osteoblast viability was assessed via surface treatment of dental implants.Methods: Amorphous zirconia was deposited using an atomic layer deposition reactor (Atomic Classic, CN1, Hwaseong, Korea) on titanium discs. Heating the samples at 400°C resulted in crystallization. Samples were divided into three groups: the control group, the group carrying amorphous ALD-zirconia (Z group), and the heat-treated group following zirconia ALD deposition (ZH group).The surface of each sample was analyzed, followed by the assessment of adhesion of Streptococcus mutans and Porphyromonas gingivalis, and viability and differentiation of MC3T3-E1 cells.Results: The adhesion of S. mutans and P. gingivalis was significantly reduced in the Z and ZH groups compared with the control group (P < 0.05). The viability of MC3T3-E1 cells was significantly increased in the ZH group compared with the control group (P < 0.001), while no significant differences were observed in the Z group (P > 0.05). Differentiation of MC3T3-E1 cells showed a marginally significant increase in the ZH group compared with the control group (P < 0.1), while no significant differences were found in the Z group (P > 0.1).Conclusion: Compared with the pure titanium group, the groups that were coated with zirconia via ALD showed a decreased adhesion of S. mutans during the early stages of biofilm formation and P. gingivalis adhesion inducing peri-implantitis, and an increase in MC3T3-E1 cell viability and differentiation. The findings indicate the possibility of treating the implant surface to reduce peri-implantitis and improve osseointegration.Keywords: atomic layer deposition, ALD, surface treatment, titanium, zirconia, implantJo YKim YTCho HJi MKHeo JLim HPDove Medical Pressarticleatomic layer depositionaldsurface treatmenttitaniumzirconiaimplantMedicine (General)R5-920ENInternational Journal of Nanomedicine, Vol Volume 16, Pp 1509-1523 (2021)
institution DOAJ
collection DOAJ
language EN
topic atomic layer deposition
ald
surface treatment
titanium
zirconia
implant
Medicine (General)
R5-920
spellingShingle atomic layer deposition
ald
surface treatment
titanium
zirconia
implant
Medicine (General)
R5-920
Jo Y
Kim YT
Cho H
Ji MK
Heo J
Lim HP
Atomic Layer Deposition of ZrO2 on Titanium Inhibits Bacterial Adhesion and Enhances Osteoblast Viability
description Yujin Jo,1 Yong Tae Kim,2 Hoonsung Cho,2 Min-Kyung Ji,3 Jaeyeong Heo,2,3 Hyun-Pil Lim1 1Department of Prosthodontics, School of Dentistry, Chonnam National University, Gwangju, Korea; 2Department of Materials Science and Engineering, Chonnam National University, Gwangju, 61186, Korea; 3Optoelectronics Convergence Research Center, Chonnam National University, Gwangju, 61186, Republic of KoreaCorrespondence: Hyun-Pil LimDepartment of Prosthodontics, School of Dentistry, Chonnam National University, Gwangju, 61186, KoreaTel +82-10-2645-7528Fax +82-62-530-5577Email mcnihil@jnu.ac.krJaeyeong HeoDepartment of Materials Science and Engineering, Chonnam National University, Gwangju, 61186, KoreaTel +82-62-530-1716Fax +82-62-530-1699Email jheo@jnu.ac.krPurpose: The study was intended to create a uniform zirconia layer even on the surface of complex structures via atomic layer deposition (ALD). The impact of crystalline zirconia deposited by ALD on bacterial adhesion and osteoblast viability was assessed via surface treatment of dental implants.Methods: Amorphous zirconia was deposited using an atomic layer deposition reactor (Atomic Classic, CN1, Hwaseong, Korea) on titanium discs. Heating the samples at 400°C resulted in crystallization. Samples were divided into three groups: the control group, the group carrying amorphous ALD-zirconia (Z group), and the heat-treated group following zirconia ALD deposition (ZH group).The surface of each sample was analyzed, followed by the assessment of adhesion of Streptococcus mutans and Porphyromonas gingivalis, and viability and differentiation of MC3T3-E1 cells.Results: The adhesion of S. mutans and P. gingivalis was significantly reduced in the Z and ZH groups compared with the control group (P < 0.05). The viability of MC3T3-E1 cells was significantly increased in the ZH group compared with the control group (P < 0.001), while no significant differences were observed in the Z group (P > 0.05). Differentiation of MC3T3-E1 cells showed a marginally significant increase in the ZH group compared with the control group (P < 0.1), while no significant differences were found in the Z group (P > 0.1).Conclusion: Compared with the pure titanium group, the groups that were coated with zirconia via ALD showed a decreased adhesion of S. mutans during the early stages of biofilm formation and P. gingivalis adhesion inducing peri-implantitis, and an increase in MC3T3-E1 cell viability and differentiation. The findings indicate the possibility of treating the implant surface to reduce peri-implantitis and improve osseointegration.Keywords: atomic layer deposition, ALD, surface treatment, titanium, zirconia, implant
format article
author Jo Y
Kim YT
Cho H
Ji MK
Heo J
Lim HP
author_facet Jo Y
Kim YT
Cho H
Ji MK
Heo J
Lim HP
author_sort Jo Y
title Atomic Layer Deposition of ZrO2 on Titanium Inhibits Bacterial Adhesion and Enhances Osteoblast Viability
title_short Atomic Layer Deposition of ZrO2 on Titanium Inhibits Bacterial Adhesion and Enhances Osteoblast Viability
title_full Atomic Layer Deposition of ZrO2 on Titanium Inhibits Bacterial Adhesion and Enhances Osteoblast Viability
title_fullStr Atomic Layer Deposition of ZrO2 on Titanium Inhibits Bacterial Adhesion and Enhances Osteoblast Viability
title_full_unstemmed Atomic Layer Deposition of ZrO2 on Titanium Inhibits Bacterial Adhesion and Enhances Osteoblast Viability
title_sort atomic layer deposition of zro2 on titanium inhibits bacterial adhesion and enhances osteoblast viability
publisher Dove Medical Press
publishDate 2021
url https://doaj.org/article/4f7b85d6d2954f728a3be103a3532517
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