Deep level transient spectroscopic investigation of phosphorus-doped silicon by self-assembled molecular monolayers
Molecular monolayer doping has been used as an enabling method for the fabrication of shallow junctions in CMOS devices. Here, Gao et al. show that an undesirable reduced ionization rate during this process can be induced by carbon defects, which electronically deactivate phosphorus dopants in silic...
Guardado en:
Autores principales: | Xuejiao Gao, Bin Guan, Abdelmadjid Mesli, Kaixiang Chen, Yaping Dan |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2018
|
Materias: | |
Acceso en línea: | https://doaj.org/article/50aa41e5e0484cee8b64606312319eb6 |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
Ejemplares similares
-
Prediction of hyperbolic exciton-polaritons in monolayer black phosphorus
por: Fanjie Wang, et al.
Publicado: (2021) -
Spectroscopic observation of oxygen dissociation on nitrogen-doped graphene
por: Mattia Scardamaglia, et al.
Publicado: (2017) - Phosphorus, sulfur, and silicon and the related elements
-
Spectroscopic studies of atomic defects and bandgap renormalization in semiconducting monolayer transition metal dichalcogenides
por: Tae Young Jeong, et al.
Publicado: (2019) -
The influence of heteroatom doping on local properties of phosphorene monolayer
por: Artur P. Durajski, et al.
Publicado: (2021)