Pecvd in-situ growth of silicon quantum dots in dielectric matrix for third generation photovoltaics
Silicon nanostructures have interesting possible applications in third generation photo- voltaics. The fabrication techniques for Si quantum dots in dielectric matrix usually involve a high-temperature post-deposition annealing. Here we report on the spontaneous growth of silicon quantum dots in...
Enregistré dans:
Auteurs principaux: | , , , |
---|---|
Format: | article |
Langue: | EN |
Publié: |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2009
|
Sujets: | |
Accès en ligne: | https://doaj.org/article/54a4d6b73db94ae98f0d4b7a22818e86 |
Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|