Atomic Layer Deposition of Ultrathin ZnO Films for Hybrid Window Layers for Cu(In<sub>x</sub>,Ga<sub>1−x</sub>)Se<sub>2</sub> Solar Cells

Atomic Layer Deposition of Ultrathin ZnO Films for Hybrid Window Layers for Cu(In<sub>x</sub>,Ga<sub>1−x</sub>)Se<sub>2</sub> Solar Cells

The efficiency of thin-film chalcogenide solar cells is dependent on their window layer thickness. However, the application of an ultrathin window layer is difficult because of the limited capability of the deposition process. This paper reports the use of atomic layer deposition (ALD) processes for...

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Autores principales: Jaebaek Lee, Dong-Hwan Jeon, Dae-Kue Hwang, Kee-Jeong Yang, Jin-Kyu Kang, Shi-Joon Sung, Hyunwoong Park, Dae-Hwan Kim
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
Materias:
ZnO
atomic layer deposition
ultrathin
window layer
CIGS
solar cells
Chemistry
QD1-999
Acceso en línea:https://doaj.org/article/56f9d62b23b94b9a98f11815770416ad
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