Atomic Layer Deposition of Ultrathin ZnO Films for Hybrid Window Layers for Cu(In<sub>x</sub>,Ga<sub>1−x</sub>)Se<sub>2</sub> Solar Cells
The efficiency of thin-film chalcogenide solar cells is dependent on their window layer thickness. However, the application of an ultrathin window layer is difficult because of the limited capability of the deposition process. This paper reports the use of atomic layer deposition (ALD) processes for...
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| Autores principales: | , , , , , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
MDPI AG
2021
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/56f9d62b23b94b9a98f11815770416ad |
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