SnO2 thin film parameter influence on gas sensitive characteristics
In this report we present results of investigation of influence of the parameters of SnO2 thin film on their gas sensitive properties. SnO2 films were deposited by spray pyrolysis method. The influence of technologic parameters on concentration of free electrons n, stoichiometry, thic...
Enregistré dans:
Auteurs principaux: | , , |
---|---|
Format: | article |
Langue: | EN |
Publié: |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2005
|
Sujets: | |
Accès en ligne: | https://doaj.org/article/594a1fd903854f3eaa81598e4f0893b4 |
Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|
Résumé: | In this report we present results of investigation of influence of the parameters of SnO2 thin
film on their gas sensitive properties. SnO2 films were deposited by spray pyrolysis method.
The influence of technologic parameters on concentration of free electrons n,
stoichiometry, thickness d and gas sensitivity S=Rgas/Rair was investigated by means of
electrophysical, IR-spectroscopy and SIMS measurements. It was established that optimal spray
solution s composition is 0.2M, which allows depositing of SnO2 films with required parameters:
n-1018
-1019
cm-3, R=105
-106
and S>10 correspondently. Obtained results on gas sensitivity are
compared with results of theoretical considerations. |
---|