Numerical Investigation of the Effects of the Beam Scanning Pattern and Overlap on the Temperature Distribution during the Laser Dopant Activation Anneal Process

Laser thermal annealing (LTA) has played an important role in the fabrication of scaled semiconductor devices by reducing the heat budget of the dopant activation process. During the laser annealing of entire wafer areas, the beam scanning pattern and overlap ratio have significant effects on unifor...

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Autores principales:	Donghyeok Choi, Joonghan Shin
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	laser thermal annealing (LTA) numerical simulation dopant activation temperature distribution multipath beam overlap Technology T Engineering (General). Civil engineering (General) TA1-2040 Biology (General) QH301-705.5 Physics QC1-999 Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/5b5d3dcaab2a441385b4956202fd6e75
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spelling	oai:doaj.org-article:5b5d3dcaab2a441385b4956202fd6e752021-11-25T16:37:17ZNumerical Investigation of the Effects of the Beam Scanning Pattern and Overlap on the Temperature Distribution during the Laser Dopant Activation Anneal Process10.3390/app1122107482076-3417https://doaj.org/article/5b5d3dcaab2a441385b4956202fd6e752021-11-01T00:00:00Zhttps://www.mdpi.com/2076-3417/11/22/10748https://doaj.org/toc/2076-3417Laser thermal annealing (LTA) has played an important role in the fabrication of scaled semiconductor devices by reducing the heat budget of the dopant activation process. During the laser annealing of entire wafer areas, the beam scanning pattern and overlap ratio have significant effects on uniform heating during the process. In this study, a numerical simulation of the LTA process was carried out using a three-dimensional transient heat transfer model. The temperature distribution produced by different laser scan paths and beam overlap ratios was analyzed. Additionally, the behavior of the dopant (phosphorus) diffusion induced under the multipath and beam overlapping conditions was numerically investigated. According to the simulation result, a zig-zag pattern generated hot spots around the corner areas of the beam path due to the greater heat accumulation per unit area; however, a bidirectional pattern induced cold spots due to the absence of laser heating around the corner areas. It was also found that the maximum temperature reachable in the beam overlapped region was much lower than that obtained along the beam scanning path, and the most uniform heating could be obtained when the zig-zag pattern and a 50% overlap ratio were used. According to the dopant diffusion and concentration distribution predicted for the case of the zig-zag pattern and 50% overlap ratio, the difference in the dopant diffusion length was approximately thirty times within the scanned area.Donghyeok ChoiJoonghan ShinMDPI AGarticlelaser thermal annealing (LTA)numerical simulationdopant activationtemperature distributionmultipathbeam overlapTechnologyTEngineering (General). Civil engineering (General)TA1-2040Biology (General)QH301-705.5PhysicsQC1-999ChemistryQD1-999ENApplied Sciences, Vol 11, Iss 10748, p 10748 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	laser thermal annealing (LTA) numerical simulation dopant activation temperature distribution multipath beam overlap Technology T Engineering (General). Civil engineering (General) TA1-2040 Biology (General) QH301-705.5 Physics QC1-999 Chemistry QD1-999
spellingShingle	laser thermal annealing (LTA) numerical simulation dopant activation temperature distribution multipath beam overlap Technology T Engineering (General). Civil engineering (General) TA1-2040 Biology (General) QH301-705.5 Physics QC1-999 Chemistry QD1-999 Donghyeok Choi Joonghan Shin Numerical Investigation of the Effects of the Beam Scanning Pattern and Overlap on the Temperature Distribution during the Laser Dopant Activation Anneal Process
description	Laser thermal annealing (LTA) has played an important role in the fabrication of scaled semiconductor devices by reducing the heat budget of the dopant activation process. During the laser annealing of entire wafer areas, the beam scanning pattern and overlap ratio have significant effects on uniform heating during the process. In this study, a numerical simulation of the LTA process was carried out using a three-dimensional transient heat transfer model. The temperature distribution produced by different laser scan paths and beam overlap ratios was analyzed. Additionally, the behavior of the dopant (phosphorus) diffusion induced under the multipath and beam overlapping conditions was numerically investigated. According to the simulation result, a zig-zag pattern generated hot spots around the corner areas of the beam path due to the greater heat accumulation per unit area; however, a bidirectional pattern induced cold spots due to the absence of laser heating around the corner areas. It was also found that the maximum temperature reachable in the beam overlapped region was much lower than that obtained along the beam scanning path, and the most uniform heating could be obtained when the zig-zag pattern and a 50% overlap ratio were used. According to the dopant diffusion and concentration distribution predicted for the case of the zig-zag pattern and 50% overlap ratio, the difference in the dopant diffusion length was approximately thirty times within the scanned area.
format	article
author	Donghyeok Choi Joonghan Shin
author_facet	Donghyeok Choi Joonghan Shin
author_sort	Donghyeok Choi
title	Numerical Investigation of the Effects of the Beam Scanning Pattern and Overlap on the Temperature Distribution during the Laser Dopant Activation Anneal Process
title_short	Numerical Investigation of the Effects of the Beam Scanning Pattern and Overlap on the Temperature Distribution during the Laser Dopant Activation Anneal Process
title_full	Numerical Investigation of the Effects of the Beam Scanning Pattern and Overlap on the Temperature Distribution during the Laser Dopant Activation Anneal Process
title_fullStr	Numerical Investigation of the Effects of the Beam Scanning Pattern and Overlap on the Temperature Distribution during the Laser Dopant Activation Anneal Process
title_full_unstemmed	Numerical Investigation of the Effects of the Beam Scanning Pattern and Overlap on the Temperature Distribution during the Laser Dopant Activation Anneal Process
title_sort	numerical investigation of the effects of the beam scanning pattern and overlap on the temperature distribution during the laser dopant activation anneal process
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/5b5d3dcaab2a441385b4956202fd6e75
work_keys_str_mv	AT donghyeokchoi numericalinvestigationoftheeffectsofthebeamscanningpatternandoverlaponthetemperaturedistributionduringthelaserdopantactivationannealprocess AT joonghanshin numericalinvestigationoftheeffectsofthebeamscanningpatternandoverlaponthetemperaturedistributionduringthelaserdopantactivationannealprocess
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Numerical Investigation of the Effects of the Beam Scanning Pattern and Overlap on the Temperature Distribution during the Laser Dopant Activation Anneal Process

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