Preparing local strain patterns in graphene by atomic force microscope based indentation
Abstract Patterning graphene into various mesoscopic devices such as nanoribbons, quantum dots, etc. by lithographic techniques has enabled the guiding and manipulation of graphene’s Dirac-type charge carriers. Graphene, with well-defined strain patterns, holds promise of similarly rich physics whil...
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Autores principales: | Péter Nemes-Incze, Gergő Kukucska, János Koltai, Jenő Kürti, Chanyong Hwang, Levente Tapasztó, László P. Biró |
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Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2017
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Materias: | |
Acceso en línea: | https://doaj.org/article/5dc24593081e4c109c72923f9de242d3 |
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