Interactive Strength between C60 Thin Film and Si(001) and Its Influence on Nano-Scaled Tribology

The influences of interactions between C60 thin films and Si substrates were investigated using atomic force microscopy (AFM). It was found that higher friction coefficient was obtained at the C60 domains formed on the H-terminated Si(001) substrate and lower ones on the Si(001)-2×1 substr...

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Autores principales:	Naohiro Matsumoto, Hiroki Suzuki, Hiroshi Kinoshita, Nobuo Ohmae
Formato:	article
Lenguaje:	EN
Publicado:	Japanese Society of Tribologists 2008
Materias:	nanotribology fullerene afm xps aes mbe Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/635ec5ab164e4de7bb21f83e26888677
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id	oai:doaj.org-article:635ec5ab164e4de7bb21f83e26888677
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spelling	oai:doaj.org-article:635ec5ab164e4de7bb21f83e268886772021-11-05T09:28:59ZInteractive Strength between C60 Thin Film and Si(001) and Its Influence on Nano-Scaled Tribology1881-219810.2474/trol.3.232https://doaj.org/article/635ec5ab164e4de7bb21f83e268886772008-08-01T00:00:00Zhttps://www.jstage.jst.go.jp/article/trol/3/4/3_4_232/_pdf/-char/enhttps://doaj.org/toc/1881-2198The influences of interactions between C60 thin films and Si substrates were investigated using atomic force microscopy (AFM). It was found that higher friction coefficient was obtained at the C60 domains formed on the H-terminated Si(001) substrate and lower ones on the Si(001)-2×1 substrate. Moreover, lowest friction coefficient was found for the C60 film on the Si(001)-2×1 remained after scratching. Therefore, it is thought that higher interactions between C60 and Si substrate caused lower friction coefficient of C60 thin film. The prepared substrate was examined by reflection high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), and Auger electron spectroscopy (AES).Naohiro MatsumotoHiroki SuzukiHiroshi KinoshitaNobuo OhmaeJapanese Society of TribologistsarticlenanotribologyfullereneafmxpsaesmbePhysicsQC1-999Engineering (General). Civil engineering (General)TA1-2040Mechanical engineering and machineryTJ1-1570ChemistryQD1-999ENTribology Online, Vol 3, Iss 4, Pp 232-237 (2008)
institution	DOAJ
collection	DOAJ
language	EN
topic	nanotribology fullerene afm xps aes mbe Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999
spellingShingle	nanotribology fullerene afm xps aes mbe Physics QC1-999 Engineering (General). Civil engineering (General) TA1-2040 Mechanical engineering and machinery TJ1-1570 Chemistry QD1-999 Naohiro Matsumoto Hiroki Suzuki Hiroshi Kinoshita Nobuo Ohmae Interactive Strength between C60 Thin Film and Si(001) and Its Influence on Nano-Scaled Tribology
description	The influences of interactions between C60 thin films and Si substrates were investigated using atomic force microscopy (AFM). It was found that higher friction coefficient was obtained at the C60 domains formed on the H-terminated Si(001) substrate and lower ones on the Si(001)-2×1 substrate. Moreover, lowest friction coefficient was found for the C60 film on the Si(001)-2×1 remained after scratching. Therefore, it is thought that higher interactions between C60 and Si substrate caused lower friction coefficient of C60 thin film. The prepared substrate was examined by reflection high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), and Auger electron spectroscopy (AES).
format	article
author	Naohiro Matsumoto Hiroki Suzuki Hiroshi Kinoshita Nobuo Ohmae
author_facet	Naohiro Matsumoto Hiroki Suzuki Hiroshi Kinoshita Nobuo Ohmae
author_sort	Naohiro Matsumoto
title	Interactive Strength between C60 Thin Film and Si(001) and Its Influence on Nano-Scaled Tribology
title_short	Interactive Strength between C60 Thin Film and Si(001) and Its Influence on Nano-Scaled Tribology
title_full	Interactive Strength between C60 Thin Film and Si(001) and Its Influence on Nano-Scaled Tribology
title_fullStr	Interactive Strength between C60 Thin Film and Si(001) and Its Influence on Nano-Scaled Tribology
title_full_unstemmed	Interactive Strength between C60 Thin Film and Si(001) and Its Influence on Nano-Scaled Tribology
title_sort	interactive strength between c60 thin film and si(001) and its influence on nano-scaled tribology
publisher	Japanese Society of Tribologists
publishDate	2008
url	https://doaj.org/article/635ec5ab164e4de7bb21f83e26888677
work_keys_str_mv	AT naohiromatsumoto interactivestrengthbetweenc60thinfilmandsi001anditsinfluenceonnanoscaledtribology AT hirokisuzuki interactivestrengthbetweenc60thinfilmandsi001anditsinfluenceonnanoscaledtribology AT hiroshikinoshita interactivestrengthbetweenc60thinfilmandsi001anditsinfluenceonnanoscaledtribology AT nobuoohmae interactivestrengthbetweenc60thinfilmandsi001anditsinfluenceonnanoscaledtribology
_version_	1718444352535003136

Interactive Strength between C60 Thin Film and Si(001) and Its Influence on Nano-Scaled Tribology

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