Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures

High-aspect ratio silicon (Si) nanostructures are important for many applications. Metal-assisted chemical etching (MACE) is a wet-chemical method used for the fabrication of nanostructured Si. Two main challenges exist with etching Si structures in the nanometer range with MACE: keeping mechanical...

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Autores principales:	Rabia Akan, Ulrich Vogt
Formato:	article
Lenguaje:	EN
Publicado:	MDPI AG 2021
Materias:	metal-assisted chemical etching Si nanostructures high aspect ratio zone plate Chemistry QD1-999
Acceso en línea:	https://doaj.org/article/63b30bd8e92345058d3618017d50c9b2
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spelling	oai:doaj.org-article:63b30bd8e92345058d3618017d50c9b22021-11-25T18:29:57ZOptimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures10.3390/nano111128062079-4991https://doaj.org/article/63b30bd8e92345058d3618017d50c9b22021-10-01T00:00:00Zhttps://www.mdpi.com/2079-4991/11/11/2806https://doaj.org/toc/2079-4991High-aspect ratio silicon (Si) nanostructures are important for many applications. Metal-assisted chemical etching (MACE) is a wet-chemical method used for the fabrication of nanostructured Si. Two main challenges exist with etching Si structures in the nanometer range with MACE: keeping mechanical stability at high aspect ratios and maintaining a vertical etching profile. In this work, we investigated the etching behavior of two zone plate catalyst designs in a systematic manner at four different MACE conditions as a function of mechanical stability and etching verticality. The zone plate catalyst designs served as models for Si nanostructures over a wide range of feature sizes ranging from 850 nm to 30 nm at 1:1 line-to-space ratio. The first design was a grid-like, interconnected catalyst (brick wall) and the second design was a hybrid catalyst that was partly isolated, partly interconnected (fishbone). Results showed that the brick wall design was mechanically stable up to an aspect ratio of 30:1 with vertical Si structures at most investigated conditions. The fishbone design showed higher mechanical stability thanks to the Si backbone in the design, but on the other hand required careful control of the reaction kinetics for etching verticality. The influence of MACE reaction kinetics was identified by lowering the oxidant concentration, lowering the processing temperature and by isopropanol addition. We report an optimized MACE condition to achieve an aspect ratio of at least 100:1 at room temperature processing by incorporating isopropanol in the etching solution.Rabia AkanUlrich VogtMDPI AGarticlemetal-assisted chemical etchingSi nanostructureshigh aspect ratiozone plateChemistryQD1-999ENNanomaterials, Vol 11, Iss 2806, p 2806 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	metal-assisted chemical etching Si nanostructures high aspect ratio zone plate Chemistry QD1-999
spellingShingle	metal-assisted chemical etching Si nanostructures high aspect ratio zone plate Chemistry QD1-999 Rabia Akan Ulrich Vogt Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures
description	High-aspect ratio silicon (Si) nanostructures are important for many applications. Metal-assisted chemical etching (MACE) is a wet-chemical method used for the fabrication of nanostructured Si. Two main challenges exist with etching Si structures in the nanometer range with MACE: keeping mechanical stability at high aspect ratios and maintaining a vertical etching profile. In this work, we investigated the etching behavior of two zone plate catalyst designs in a systematic manner at four different MACE conditions as a function of mechanical stability and etching verticality. The zone plate catalyst designs served as models for Si nanostructures over a wide range of feature sizes ranging from 850 nm to 30 nm at 1:1 line-to-space ratio. The first design was a grid-like, interconnected catalyst (brick wall) and the second design was a hybrid catalyst that was partly isolated, partly interconnected (fishbone). Results showed that the brick wall design was mechanically stable up to an aspect ratio of 30:1 with vertical Si structures at most investigated conditions. The fishbone design showed higher mechanical stability thanks to the Si backbone in the design, but on the other hand required careful control of the reaction kinetics for etching verticality. The influence of MACE reaction kinetics was identified by lowering the oxidant concentration, lowering the processing temperature and by isopropanol addition. We report an optimized MACE condition to achieve an aspect ratio of at least 100:1 at room temperature processing by incorporating isopropanol in the etching solution.
format	article
author	Rabia Akan Ulrich Vogt
author_facet	Rabia Akan Ulrich Vogt
author_sort	Rabia Akan
title	Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures
title_short	Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures
title_full	Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures
title_fullStr	Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures
title_full_unstemmed	Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures
title_sort	optimization of metal-assisted chemical etching for deep silicon nanostructures
publisher	MDPI AG
publishDate	2021
url	https://doaj.org/article/63b30bd8e92345058d3618017d50c9b2
work_keys_str_mv	AT rabiaakan optimizationofmetalassistedchemicaletchingfordeepsiliconnanostructures AT ulrichvogt optimizationofmetalassistedchemicaletchingfordeepsiliconnanostructures
_version_	1718411078288801792

Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures

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