Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures
High-aspect ratio silicon (Si) nanostructures are important for many applications. Metal-assisted chemical etching (MACE) is a wet-chemical method used for the fabrication of nanostructured Si. Two main challenges exist with etching Si structures in the nanometer range with MACE: keeping mechanical...
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| Autores principales: | , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
MDPI AG
2021
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| Acceso en línea: | https://doaj.org/article/63b30bd8e92345058d3618017d50c9b2 |
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